INFLUENCE OF AXISYMMETRIC MAGNETIC FIELD ON CATHODE SPOTS MOVEMENT IN ARC ION PLATING

doi:10.3724/SP.J.1037.2009.00556

IMR OpenIR

	INFLUENCE OF AXISYMMETRIC MAGNETIC FIELD ON CATHODE SPOTS MOVEMENT IN ARC ION PLATING
	Lang Wenchang 1; Xiao Jinquan 1,2; Gong Jun 1; Sun Chao 1; Hung Rongfang 2; Wen Lishi 1
通讯作者	Wen Lishi(lswen@imr.ac.cn)
	2010-03-11
发表期刊	ACTA METALLURGICA SINICA
ISSN	0412-1961
卷号	46 期号:3 页码:372-379
摘要	Arc ion plating (AIP) has been widely utilized in the deposition of various kinds of thin solid films due to the excellent characteristics of the arc plasma produced from an active cathode spot that emits ions of cathode material, as well as electrons. In AIP process, the cathode spot is usually steered by an external magnetic field. Cathode spot motion is the key factor because it affects the physical characteristics of the vacuum arc plasma, the utilization of the cathode material, the emission of macroparticles (MPs) and the quality of subsequent films containing these MPs. Therefore, cathode spot dynamics should be understood practically under a compound external magnetic field, such as in axisymmetric magnetic field (AMF), for industrial applications. An AMF produced by using an adjustable electromagnetic coil associated with a concentric magnetic flux guider was applied to the cathode surface to investigate the influence of the AMP on the arc cathode spot motion. The distribution of the magnetic field was simulated by the finite element method (FEM) software. The magnetic field intensity was measured by an SHT-V magnetometer and the distributions of magnetic field with different intensities were analyzed. Based on the results of FEM simulation and the physical mechanism of the arc cathode spot discharge, the effects of magnetic-field components and AMP on the cathode spot movement were discussed. The results showed that increasing the AMP intensity can strongly influence cathode spot movement. In the case of a weak AMF, the cathode spot moves randomly on the cathode surface. With increasing AM F, there is an increasing tendency for the cathode spot to rotate and drift toward the cathode target edge. The increase in the transverse magnetic field (TMF) intensity, B(T) can accelerate the rotational velocity of the cathode spot; increase the arc voltage and decrease the arc current. With a relatively strong AMF (B(T) approximate to 30 Gs), the cathode spot rotates near the edge of the cathode surface and is confined to a circular trajectory. A new arc cathode spot is ignited, splits, and is extinguished repeatedly on the cathode surface, which can be observed at intervals of about 0.5 s, while there is an obvious erosion track left at the bottom of the cathode edge.
关键词	arc ion plating axisymmetric magnetic field finite element analysis cathode spot movement
资助者	National High Technology Research and Development Program of China
DOI	10.3724/SP.J.1037.2009.00556
收录类别	SCI
语种	英语
资助项目	National High Technology Research and Development Program of China[2006AA03Z521]
WOS研究方向	Metallurgy & Metallurgical Engineering
WOS类目	Metallurgy & Metallurgical Engineering
WOS记录号	WOS:000276824000017
出版者	SCIENCE CHINA PRESS
引用统计	被引频次：11[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/100122
专题	中国科学院金属研究所
通讯作者	Wen Lishi
作者单位	1.Chinese Acad Sci, Inst Met Res, Div Surface Engn Mat, Shenyang 110016, Peoples R China 2.Hunan YKH Surface Engn Co Ltd, Changsha 410013, Hunan, Peoples R China
推荐引用方式 GB/T 7714	Lang Wenchang,Xiao Jinquan,Gong Jun,et al. INFLUENCE OF AXISYMMETRIC MAGNETIC FIELD ON CATHODE SPOTS MOVEMENT IN ARC ION PLATING[J]. ACTA METALLURGICA SINICA,2010,46(3):372-379.
APA	Lang Wenchang,Xiao Jinquan,Gong Jun,Sun Chao,Hung Rongfang,&Wen Lishi.(2010).INFLUENCE OF AXISYMMETRIC MAGNETIC FIELD ON CATHODE SPOTS MOVEMENT IN ARC ION PLATING.ACTA METALLURGICA SINICA,46(3),372-379.
MLA	Lang Wenchang,et al."INFLUENCE OF AXISYMMETRIC MAGNETIC FIELD ON CATHODE SPOTS MOVEMENT IN ARC ION PLATING".ACTA METALLURGICA SINICA 46.3(2010):372-379.