Arc ion plated-Cr2O3 intermediate film as a diffusion barrier between NiCrAlY and gamma-TiAl | |
Cheng, Y. X.; Wang, W.; Zhu, S. L.; Xin, L.; Wang, F. H. | |
通讯作者 | Cheng, Y. X.(yxcheng@imr.ac.cn) |
2010-04-01 | |
发表期刊 | INTERMETALLICS
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ISSN | 0966-9795 |
卷号 | 18期号:4页码:736-739 |
摘要 | The effectiveness of an arc ion plated-Cr2O3 intermediate film as a diffusion barrier between NiCrAlY and gamma-TiAl was evaluated by annealing at 1000 degrees C. The results showed that Cr2O3 acted as an active diffusion barrier by formation of two continuous Al-rich oxide layers at both the TiAl/Cr2O3 and Cr2O3/NiCrAlY interfaces, suppressing the inward diffusion of Ni from NiCrAlY overlay coating to gamma-TiAl substrate effectively. (C) 2009 Elsevier Ltd. All rights reserved. |
关键词 | Titanium aluminides, based on TiAl Oxidation Diffusion Vapour deposition |
资助者 | National Natural Science Foundation of China |
DOI | 10.1016/j.intermet.2009.10.009 |
收录类别 | SCI |
语种 | 英语 |
资助项目 | National Natural Science Foundation of China[50774074] |
WOS研究方向 | Chemistry ; Materials Science ; Metallurgy & Metallurgical Engineering |
WOS类目 | Chemistry, Physical ; Materials Science, Multidisciplinary ; Metallurgy & Metallurgical Engineering |
WOS记录号 | WOS:000276058200049 |
出版者 | ELSEVIER SCI LTD |
引用统计 | |
文献类型 | 期刊论文 |
条目标识符 | http://ir.imr.ac.cn/handle/321006/101144 |
专题 | 中国科学院金属研究所 |
通讯作者 | Cheng, Y. X. |
作者单位 | Chinese Acad Sci, Inst Met Res, State Key Lab Corros & Protect, Shenyang 110016, Peoples R China |
推荐引用方式 GB/T 7714 | Cheng, Y. X.,Wang, W.,Zhu, S. L.,et al. Arc ion plated-Cr2O3 intermediate film as a diffusion barrier between NiCrAlY and gamma-TiAl[J]. INTERMETALLICS,2010,18(4):736-739. |
APA | Cheng, Y. X.,Wang, W.,Zhu, S. L.,Xin, L.,&Wang, F. H..(2010).Arc ion plated-Cr2O3 intermediate film as a diffusion barrier between NiCrAlY and gamma-TiAl.INTERMETALLICS,18(4),736-739. |
MLA | Cheng, Y. X.,et al."Arc ion plated-Cr2O3 intermediate film as a diffusion barrier between NiCrAlY and gamma-TiAl".INTERMETALLICS 18.4(2010):736-739. |
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