VI/II ratio-dependent growth and photoluminescence of cubic CdSe epilayers by molecular beam epitaxy | |
Zhao, Jie1,2; Zeng, Yiping1,2; Yang, Qiumin1,2; Li, Yiyang1,2; Cui, Lijie1,2; Liu, Chao1,2 | |
通讯作者 | Zhao, Jie(jiezhao@semi.ac.cn) |
2011-08-15 | |
发表期刊 | JOURNAL OF CRYSTAL GROWTH
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ISSN | 0022-0248 |
卷号 | 329期号:1页码:1-5 |
摘要 | CdSe epilayers were grown on GaAs(0 0 1) substrates by molecular beam epitaxy (MBE) in a wide range of VI/II beam-equivalent-pressure (BEP) ratio from 1.1 to 8.5. X-ray diffraction (XRD) theta-2 theta scan reveals all the CdSe samples possess cubic zinc blende structure with (0 0 1) orientation. The film grown at a low VI/II ratio of 1.1 has rough surface with a three-dimensional (3D) growth mode, while two-dimensional (2D) growth can be established under Se-rich conditions at higher Se/Cd BEP ratios over 4.4. The growth rate increases monotonically with the VI/II ratio and becomes saturated when the ratio is raised to 8.5. The sample grown at a VI/II ratio of 8.5 shows the narrowest full-width at half-maximum (FWHM) of X-ray rocking curve (XRC) for (0 0 4) reflection. No near-band-edge (NBE) emission of CdSe is observed for the sample prepared at a low ratio of 1.1. The NBE emission from cubic CdSe at around 1.67 eV appears and its intensity is markedly enhanced by elevating the VI/II ratio. It is suggested that CdSe epilayer with good structural and optical properties can be prepared under a large VI/II BEP ratio. (C) 2011 Elsevier B.V. All rights reserved. |
关键词 | Reflection high-energy electron diffraction X-ray diffraction Atomic force microscopy Molecular beam epitaxy Cadmium compounds Semiconducting II-VI materials |
资助者 | Knowledge Innovation Program Foundation of Institute of semiconductors, Chinese Academy of Sciences ; National Natural Science Foundation of China |
DOI | 10.1016/j.jcrysgro.2011.06.029 |
收录类别 | SCI |
语种 | 英语 |
资助项目 | Knowledge Innovation Program Foundation of Institute of semiconductors, Chinese Academy of Sciences[09S1010001] ; National Natural Science Foundation of China[0913120000] |
WOS研究方向 | Crystallography ; Materials Science ; Physics |
WOS类目 | Crystallography ; Materials Science, Multidisciplinary ; Physics, Applied |
WOS记录号 | WOS:000294104500001 |
出版者 | ELSEVIER SCIENCE BV |
引用统计 | |
文献类型 | 期刊论文 |
条目标识符 | http://ir.imr.ac.cn/handle/321006/104943 |
专题 | 中国科学院金属研究所 |
通讯作者 | Zhao, Jie |
作者单位 | 1.Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China 2.Chinese Acad Sci, Inst Semicond, Ctr Mat Sci, Beijing 100083, Peoples R China |
推荐引用方式 GB/T 7714 | Zhao, Jie,Zeng, Yiping,Yang, Qiumin,et al. VI/II ratio-dependent growth and photoluminescence of cubic CdSe epilayers by molecular beam epitaxy[J]. JOURNAL OF CRYSTAL GROWTH,2011,329(1):1-5. |
APA | Zhao, Jie,Zeng, Yiping,Yang, Qiumin,Li, Yiyang,Cui, Lijie,&Liu, Chao.(2011).VI/II ratio-dependent growth and photoluminescence of cubic CdSe epilayers by molecular beam epitaxy.JOURNAL OF CRYSTAL GROWTH,329(1),1-5. |
MLA | Zhao, Jie,et al."VI/II ratio-dependent growth and photoluminescence of cubic CdSe epilayers by molecular beam epitaxy".JOURNAL OF CRYSTAL GROWTH 329.1(2011):1-5. |
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