In situ deposition of highly C-axis oriented lanthanum modified lead titanate thin films by multi-ion-beam reactive co-sputtering technique

IMR OpenIR

	In situ deposition of highly C-axis oriented lanthanum modified lead titanate thin films by multi-ion-beam reactive co-sputtering technique
	Zhu, J ; Xiao, D ; Zhu, J ; Zen, J
通讯作者	Zhu, J(nic0400@scuu.edu.cn) ; Zhu, J()
	1999
发表期刊	CRYSTAL RESEARCH AND TECHNOLOGY
ISSN	0232-1300
卷号	34 期号:8 页码:989-993
摘要	Highly c-axis oriented La-modified PbTiO3 (PLT) thin films were in situ grown on Pt(100)/MgO(100) and MgO(100) substrates by multi-ion-beam reactive co-sputtering (MIBRECS) technique at the substrate temperature range of 450 degrees C-540 degrees C. The orientation degree alpha of the films is more than 90%. The chemical composition is in good agreement with the designed one and is almost uniform across the surface of the substrates. The remanent polarization (P-r) and coercive field (E-c) were found to be 5.3 mu C/cm(2) and 78 kV/cm, respectively.
关键词	ferroelectric thin film sputtering (Pb,La)TiO3
收录类别	SCI
语种	英语
WOS研究方向	Crystallography
WOS类目	Crystallography
WOS记录号	WOS:000083136900007
出版者	WILEY-V C H VERLAG GMBH
引用统计
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/108911
专题	中国科学院金属研究所
通讯作者	Zhu, J; Zhu, J
作者单位	1.Sichuan Univ, Dept Mat Sci, Chengdu 610064, Peoples R China 2.Acad Sinica, Int Ctr Mat Phys, Shengyang, Peoples R China 3.Sichuan Univ, Ctr Anal & Test, Chengdu 610064, Peoples R China
推荐引用方式 GB/T 7714	Zhu, J,Xiao, D,Zhu, J,et al. In situ deposition of highly C-axis oriented lanthanum modified lead titanate thin films by multi-ion-beam reactive co-sputtering technique[J]. CRYSTAL RESEARCH AND TECHNOLOGY,1999,34(8):989-993.
APA	Zhu, J,Xiao, D,Zhu, J,&Zen, J.(1999).In situ deposition of highly C-axis oriented lanthanum modified lead titanate thin films by multi-ion-beam reactive co-sputtering technique.CRYSTAL RESEARCH AND TECHNOLOGY,34(8),989-993.
MLA	Zhu, J,et al."In situ deposition of highly C-axis oriented lanthanum modified lead titanate thin films by multi-ion-beam reactive co-sputtering technique".CRYSTAL RESEARCH AND TECHNOLOGY 34.8(1999):989-993.