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Simulation of the influence of the filament arrangement on the gas phase during hot filament chemical vapor deposition of diamond films
Song, GH; Sun, C; Huang, RF; Wen, LS
Corresponding AuthorWen, LS()
2000-05-01
Source PublicationJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
ISSN0734-2101
Volume18Issue:3Pages:860-863
AbstractThe uniform temperature and mass current density of gas in deposition regions of films were very important to obtain uniform diamond films over a large area during hot filament chemical vapor deposition. The simulation showed that the two physical parameters of gas in the chamber varied as a function of space and were influenced by the arrangement of the filaments and the initial rate of the introduced gas. Regions of uniform temperature and mass current density existed in the chamber. The distributions of temperature and mass current density did not vary with the filament diameter. However, the value of the two physical parameters increased and declined with the increment of the diameter, respectively. An optimum distance between filaments was necessary to obtain uniform films over a large area. The mass current density increased with the initial rate of the introduced gas. These results might provide a basis for optimizing the technological parameters to obtain uniform diamond films over a large area. (C) 2000 American Vacuum Society. [S0734-2101(00)03703-9].
Indexed BySCI
Language英语
WOS Research AreaMaterials Science ; Physics
WOS SubjectMaterials Science, Coatings & Films ; Physics, Applied
WOS IDWOS:000087118000011
PublisherAMER INST PHYSICS
Citation statistics
Cited Times:15[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/111147
Collection中国科学院金属研究所
Corresponding AuthorWen, LS
Affiliation1.Chinese Acad Sci, Met Res Inst, Shenyang 110015, Peoples R China
2.Shenyang Polytech Univ, Dept Mat Engn, Shenyang 110026, Peoples R China
Recommended Citation
GB/T 7714
Song, GH,Sun, C,Huang, RF,et al. Simulation of the influence of the filament arrangement on the gas phase during hot filament chemical vapor deposition of diamond films[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,2000,18(3):860-863.
APA Song, GH,Sun, C,Huang, RF,&Wen, LS.(2000).Simulation of the influence of the filament arrangement on the gas phase during hot filament chemical vapor deposition of diamond films.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,18(3),860-863.
MLA Song, GH,et al."Simulation of the influence of the filament arrangement on the gas phase during hot filament chemical vapor deposition of diamond films".JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS 18.3(2000):860-863.
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