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Simulations of temperature field in HFCVD diamond films with large area
Wang, AY; Sun, C; Wang, B; Gong, J; Huang, RF; Wen, LS
Corresponding AuthorWang, AY()
2001-11-18
Source PublicationACTA METALLURGICA SINICA
ISSN0412-1961
Volume37Issue:11Pages:1217-1222
AbstractNumerical simulations were used to investigate the influence of various hot filaments and other deposition parameters on substrate temperature field which affects significantly the growth and quality of diamond films by hot-filament chemical vapor deposition (HFCVD). It was found that the homogenous substrate temperature region 76 mm x 76 min with the maximum temperature fluctuation no more than 5% could be obtained by a 80 mm x 80 mm filamentary heater and it could be improved to 100 mm x 100 mm under the condition of supplementary hot filaments with appropriate parameters. All of these theoretical results provided the basis for optimizing the technological parameters to deposit high quality and uniform diamond films over large area.
KeywordHFCVD diamond films temperature field simulation
Indexed BySCI
Language英语
WOS Research AreaMetallurgy & Metallurgical Engineering
WOS SubjectMetallurgy & Metallurgical Engineering
WOS IDWOS:000172839900018
PublisherSCIENCE CHINA PRESS
Citation statistics
Cited Times:4[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/112895
Collection中国科学院金属研究所
Corresponding AuthorWang, AY
AffiliationChinese Acad Sci, Met Res Inst, Shenyang 110016, Peoples R China
Recommended Citation
GB/T 7714
Wang, AY,Sun, C,Wang, B,et al. Simulations of temperature field in HFCVD diamond films with large area[J]. ACTA METALLURGICA SINICA,2001,37(11):1217-1222.
APA Wang, AY,Sun, C,Wang, B,Gong, J,Huang, RF,&Wen, LS.(2001).Simulations of temperature field in HFCVD diamond films with large area.ACTA METALLURGICA SINICA,37(11),1217-1222.
MLA Wang, AY,et al."Simulations of temperature field in HFCVD diamond films with large area".ACTA METALLURGICA SINICA 37.11(2001):1217-1222.
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