Microstructure studies of TiO2-Ag-TiO2-SiO low-emissivity films at nanometer scale

IMR OpenIR

	Microstructure studies of TiO2-Ag-TiO2-SiO low-emissivity films at nanometer scale
	Zhan, Q ; Yu, R ; He, LL ; Li, DX ; Guo, XN
通讯作者	Zhan, Q()
	2001-04-18
发表期刊	ACTA METALLURGICA SINICA
ISSN	0412-1961
卷号	37 期号:4 页码:337-339
摘要	The cross-sectional samples of TiO2-Ag-TiO2-SiO multilayer films are prepared and their microstructures are studied by TEM, HREM and nanobeam EDS analysis. The results show that the thickness of every layer is uniform and the interface is sharp and smooth. The Ag layer is nanocrystal while TiO2 and SiO are amorphous. Nanometer-beam EDS, analysis demonstrated that diffusion of Ag did not occur, which is a strong factor to ensure the whole film's properties.
关键词	low-emissivity film microstructure HREM nanometer-beam analysis
收录类别	SCI
语种	英语
WOS研究方向	Metallurgy & Metallurgical Engineering
WOS类目	Metallurgy & Metallurgical Engineering
WOS记录号	WOS:000172766600001
出版者	SCIENCE CHINA PRESS
引用统计	被引频次：3[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/113593
专题	中国科学院金属研究所
通讯作者	Zhan, Q
作者单位	1.Chinese Acad Sci, Met Res Inst, Atom Imaging Solids Lab, Shenyang 110046, Peoples R China 2.Shanghai Jiao Tong Univ, Inst Mat, Shanghai 200030, Peoples R China
推荐引用方式 GB/T 7714	Zhan, Q,Yu, R,He, LL,et al. Microstructure studies of TiO2-Ag-TiO2-SiO low-emissivity films at nanometer scale[J]. ACTA METALLURGICA SINICA,2001,37(4):337-339.
APA	Zhan, Q,Yu, R,He, LL,Li, DX,&Guo, XN.(2001).Microstructure studies of TiO2-Ag-TiO2-SiO low-emissivity films at nanometer scale.ACTA METALLURGICA SINICA,37(4),337-339.
MLA	Zhan, Q,et al."Microstructure studies of TiO2-Ag-TiO2-SiO low-emissivity films at nanometer scale".ACTA METALLURGICA SINICA 37.4(2001):337-339.