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Numerical study of temperature field in HFCVD diamond films
Wang, AY; Sun, C; Zou, YS; Huang, RF; Wen, LS
Corresponding AuthorWang, AY()
2002-11-01
Source PublicationACTA METALLURGICA SINICA
ISSN0412-1961
Volume38Issue:11Pages:1228-1232
AbstractWhen the relative parameters of hot filaments were fixed at the optimal values, the irradiance distribution and the temperature distribution of substrate were simulated during the growing process HFCVD diamond films. Considering the effect of heat conduction, the substrate temperature distributions under the condition of adiabatic border and 1000 K isothermal border are more uniform than those in pure heat radiation system. All these results may provide the basis for the growth of diamond films in HFCVD.
Keyworddiamond film irradiance temperature field heat conduction HFCVD
Indexed BySCI
Language英语
WOS Research AreaMetallurgy & Metallurgical Engineering
WOS SubjectMetallurgy & Metallurgical Engineering
WOS IDWOS:000179827800019
PublisherSCIENCE CHINA PRESS
Citation statistics
Cited Times:1[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/114080
Collection中国科学院金属研究所
Corresponding AuthorWang, AY
AffiliationChinese Acad Sci, Inst Met Res, Shenyang 110016, Peoples R China
Recommended Citation
GB/T 7714
Wang, AY,Sun, C,Zou, YS,et al. Numerical study of temperature field in HFCVD diamond films[J]. ACTA METALLURGICA SINICA,2002,38(11):1228-1232.
APA Wang, AY,Sun, C,Zou, YS,Huang, RF,&Wen, LS.(2002).Numerical study of temperature field in HFCVD diamond films.ACTA METALLURGICA SINICA,38(11),1228-1232.
MLA Wang, AY,et al."Numerical study of temperature field in HFCVD diamond films".ACTA METALLURGICA SINICA 38.11(2002):1228-1232.
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