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Preparation and structure of nano-crystalline WO3(Si) thin films by pulsed excimer laser deposition
Fang, GJ; Liu, ZL; Yao, KL
Corresponding AuthorFang, GJ()
2002
Source PublicationJOURNAL OF INORGANIC MATERIALS
ISSN1000-324X
Volume17Issue:1Pages:139-144
AbstractWO,, thin films were successfully synthesized on Si (111) substrate at different conditions by using scanning excimer laser ablation technique. The structure of WOx thin films deposited at different conditions was analyzed by STEM, XRD, RS. The thin films deposited at 300 and 400degreesC under 20Pa oxygen pressure showed nano-crystalline triclinic structure. The experimental results illustrate that the oxygen pressure and the deposition temperature are two important parameters for determining the structure and chemical composition of the synthesized thin films.
KeywordWO3 thin films nano-crystalline PLD technique structural analyses preparation conditions Si (111)
Indexed BySCI
Language英语
WOS Research AreaMaterials Science
WOS SubjectMaterials Science, Ceramics
WOS IDWOS:000174436700023
PublisherSCIENCE CHINA PRESS
Citation statistics
Cited Times:3[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/114896
Collection中国科学院金属研究所
Corresponding AuthorFang, GJ
Affiliation1.Huazhong Univ Sci & Technol, Natl Lab Laser Technol, Wuhan 430074, Peoples R China
2.Huazhong Univ Sci & Technol, Dept Phys, Wuhan 430074, Peoples R China
3.Xiangfan Univ, Dept Phys, Xiangtan 441053, Peoples R China
4.Chinese Acad Sci, Int Ctr Mat Phys, Shenyang 110015, Peoples R China
Recommended Citation
GB/T 7714
Fang, GJ,Liu, ZL,Yao, KL. Preparation and structure of nano-crystalline WO3(Si) thin films by pulsed excimer laser deposition[J]. JOURNAL OF INORGANIC MATERIALS,2002,17(1):139-144.
APA Fang, GJ,Liu, ZL,&Yao, KL.(2002).Preparation and structure of nano-crystalline WO3(Si) thin films by pulsed excimer laser deposition.JOURNAL OF INORGANIC MATERIALS,17(1),139-144.
MLA Fang, GJ,et al."Preparation and structure of nano-crystalline WO3(Si) thin films by pulsed excimer laser deposition".JOURNAL OF INORGANIC MATERIALS 17.1(2002):139-144.
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