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Plasma model in aluminum nano-films
Du, H; Lee, SW; Sun, C; Wen, LS
Corresponding AuthorDu, H()
2003
Source PublicationECO-MATERIALS PROCESSING & DESIGN
ISSN0255-5476
Volume439Pages:277-281
AbstractThe mode of electromagnetic response of aluminum nano-films has been suggested by meaning of electromagnetic wave reflectance, transmittance and carrier density of the films. The carrier density of the films and dependence of their plasma frequency on the film thickness have been obtained. On the other hand, the dependence of absorptance on the frequency of electromagnetic wave field has been set up by using the measured reflectance and transmittance, which provides relationship between plasma frequency and film thickness. Both plasma frequency and film thickness proved plasma resonance.
Keywordaluminum nano-film electromagnetic response size effect
Indexed BySCI
Language英语
WOS Research AreaMaterials Science
WOS SubjectMaterials Science, Multidisciplinary
WOS IDWOS:000187496500048
PublisherTRANS TECH PUBLICATIONS LTD
Citation statistics
Cited Times:1[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/115809
Collection中国科学院金属研究所
Corresponding AuthorDu, H
Affiliation1.Sun Moon Univ, Dept Mat Engn, Asan 336708, Chungnam, South Korea
2.Acad Sinica, Inst Met Res, Shenyang 110016, Peoples R China
Recommended Citation
GB/T 7714
Du, H,Lee, SW,Sun, C,et al. Plasma model in aluminum nano-films[J]. ECO-MATERIALS PROCESSING & DESIGN,2003,439:277-281.
APA Du, H,Lee, SW,Sun, C,&Wen, LS.(2003).Plasma model in aluminum nano-films.ECO-MATERIALS PROCESSING & DESIGN,439,277-281.
MLA Du, H,et al."Plasma model in aluminum nano-films".ECO-MATERIALS PROCESSING & DESIGN 439(2003):277-281.
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