| Plasma model in aluminum nano-films | |
| Du, H; Lee, SW; Sun, C; Wen, LS | |
| Corresponding Author | Du, H() |
| 2003 | |
| Source Publication | ECO-MATERIALS PROCESSING & DESIGN
 |
| ISSN | 0255-5476 |
| Volume | 439Pages:277-281 |
| Abstract | The mode of electromagnetic response of aluminum nano-films has been suggested by meaning of electromagnetic wave reflectance, transmittance and carrier density of the films. The carrier density of the films and dependence of their plasma frequency on the film thickness have been obtained. On the other hand, the dependence of absorptance on the frequency of electromagnetic wave field has been set up by using the measured reflectance and transmittance, which provides relationship between plasma frequency and film thickness. Both plasma frequency and film thickness proved plasma resonance. |
| Keyword | aluminum nano-film electromagnetic response size effect |
| Indexed By | SCI |
| Language | 英语 |
| WOS Research Area | Materials Science |
| WOS Subject | Materials Science, Multidisciplinary |
| WOS ID | WOS:000187496500048 |
| Publisher | TRANS TECH PUBLICATIONS LTD |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.imr.ac.cn/handle/321006/115811 |
| Collection | 中国科学院金属研究所 |
| Corresponding Author | Du, H |
| Affiliation | 1.Sun Moon Univ, Dept Mat Engn, Asan 336708, Chungnam, South Korea 2.Acad Sinica, Inst Met Res, Shenyang 110016, Peoples R China |
| Recommended Citation GB/T 7714 | Du, H,Lee, SW,Sun, C,et al. Plasma model in aluminum nano-films[J]. ECO-MATERIALS PROCESSING & DESIGN,2003,439:277-281. |
| APA | Du, H,Lee, SW,Sun, C,&Wen, LS.(2003).Plasma model in aluminum nano-films.ECO-MATERIALS PROCESSING & DESIGN,439,277-281. |
| MLA | Du, H,et al."Plasma model in aluminum nano-films".ECO-MATERIALS PROCESSING & DESIGN 439(2003):277-281. |
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