Plasma model in aluminum nano-films

IMR OpenIR

	Plasma model in aluminum nano-films
	Du, H ; Lee, SW ; Sun, C ; Wen, LS
通讯作者	Du, H()
	2003
发表期刊	ECO-MATERIALS PROCESSING & DESIGN
ISSN	0255-5476
卷号	439 页码:277-281
摘要	The mode of electromagnetic response of aluminum nano-films has been suggested by meaning of electromagnetic wave reflectance, transmittance and carrier density of the films. The carrier density of the films and dependence of their plasma frequency on the film thickness have been obtained. On the other hand, the dependence of absorptance on the frequency of electromagnetic wave field has been set up by using the measured reflectance and transmittance, which provides relationship between plasma frequency and film thickness. Both plasma frequency and film thickness proved plasma resonance.
关键词	aluminum nano-film electromagnetic response size effect
收录类别	SCI
语种	英语
WOS研究方向	Materials Science
WOS类目	Materials Science, Multidisciplinary
WOS记录号	WOS:000187496500048
出版者	TRANS TECH PUBLICATIONS LTD
引用统计	被引频次：1[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/115811
专题	中国科学院金属研究所
通讯作者	Du, H
作者单位	1.Sun Moon Univ, Dept Mat Engn, Asan 336708, Chungnam, South Korea 2.Acad Sinica, Inst Met Res, Shenyang 110016, Peoples R China
推荐引用方式 GB/T 7714	Du, H,Lee, SW,Sun, C,et al. Plasma model in aluminum nano-films[J]. ECO-MATERIALS PROCESSING & DESIGN,2003,439:277-281.
APA	Du, H,Lee, SW,Sun, C,&Wen, LS.(2003).Plasma model in aluminum nano-films.ECO-MATERIALS PROCESSING & DESIGN,439,277-281.
MLA	Du, H,et al."Plasma model in aluminum nano-films".ECO-MATERIALS PROCESSING & DESIGN 439(2003):277-281.