Investigation of phase structure and performance of (Ti, Al)N films deposited by arc ion plating | |
Li, MS; Wang, FH; Wang, TG; Gong, J; Sun, C; Wen, LS | |
通讯作者 | Li, MS() |
2003 | |
发表期刊 | ACTA METALLURGICA SINICA
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ISSN | 0412-1961 |
卷号 | 39期号:1页码:55-60 |
摘要 | (Ti, Al)N films with different Al contents were deposited on 1Cr11Ni2W2MoV stainless steel by arc ion plating. As the aluminum content increased, the film structure changes from type B1(NaCl) to type B4(ZnS). The preferred orientation of (Ti, Al)N films with B1 structure changes from (111) to (220) with the increase of Al content. The lattice parameter of (Ti, AI)N decreases with increasing Al content for both B1 and B4 structures. The hardness, adhesive strength and wear-resistant character of films first increase then decrease with the increase in Al content, which is related to the change of the film structure, preferred orientation and stress in the films. The introduction of Al dramatically improves the oxidation-resistance of (Ti,Al)N films. |
关键词 | arc ion plating (Ti, Al)N film structure change mechanical property |
收录类别 | SCI |
语种 | 英语 |
WOS研究方向 | Metallurgy & Metallurgical Engineering |
WOS类目 | Metallurgy & Metallurgical Engineering |
WOS记录号 | WOS:000180699100013 |
出版者 | SCIENCE CHINA PRESS |
引用统计 | |
文献类型 | 期刊论文 |
条目标识符 | http://ir.imr.ac.cn/handle/321006/116337 |
专题 | 中国科学院金属研究所 |
通讯作者 | Li, MS |
作者单位 | 1.Chinese Acad Sci, Inst Met Res, State Key Lab Corros & Protect, Shenyang 110016, Peoples R China 2.Chinese Acad Sci, Inst Met Res, Met Res Inst, Shenyang 110016, Peoples R China |
推荐引用方式 GB/T 7714 | Li, MS,Wang, FH,Wang, TG,et al. Investigation of phase structure and performance of (Ti, Al)N films deposited by arc ion plating[J]. ACTA METALLURGICA SINICA,2003,39(1):55-60. |
APA | Li, MS,Wang, FH,Wang, TG,Gong, J,Sun, C,&Wen, LS.(2003).Investigation of phase structure and performance of (Ti, Al)N films deposited by arc ion plating.ACTA METALLURGICA SINICA,39(1),55-60. |
MLA | Li, MS,et al."Investigation of phase structure and performance of (Ti, Al)N films deposited by arc ion plating".ACTA METALLURGICA SINICA 39.1(2003):55-60. |
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