Microstructure and hardness of chromium oxide coatings by arc ion plating | |
Ji, AL; Wang, W; Song, GH; Wang, AY; Sin, C; Wen, LS | |
Corresponding Author | Ji, AL() |
2003-09-01 | |
Source Publication | ACTA METALLURGICA SINICA
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ISSN | 0412-1961 |
Volume | 39Issue:9Pages:979-983 |
Abstract | Chromium oxide thin film was deposited on stainless steel by arc ion plating (ATP). The effects of the flow rate of oxygen and pulse bias voltage on the structure, deposition rate and the surface morphology of thin film were studied. The microhardness of thin film was measured at different pulse bias voltage. The results show that the Cr2O3 film has {001} plane texture at the oxygen flow rate of 130 cm(3)/s and a bias voltage of -100 V. The higher the oxygen flow rate and bias voltage, the less the big particles in the thin film. Stoichiometric Cr2O3 thin film obtained at oxygen flow rate of 130 cm(3)/s and a bias voltage of -200 V has an optimal hardness value up to 36 GPa. |
Keyword | Cr2O3 thin film arc ion plating microstructure pulse bias voltage |
Indexed By | SCI |
Language | 英语 |
WOS Research Area | Metallurgy & Metallurgical Engineering |
WOS Subject | Metallurgy & Metallurgical Engineering |
WOS ID | WOS:000186144000016 |
Publisher | SCIENCE CHINA PRESS |
Citation statistics | |
Document Type | 期刊论文 |
Identifier | http://ir.imr.ac.cn/handle/321006/117548 |
Collection | 中国科学院金属研究所 |
Corresponding Author | Ji, AL |
Affiliation | Chinese Acad Sci, Inst Met Res, Shenyang 110016, Peoples R China |
Recommended Citation GB/T 7714 | Ji, AL,Wang, W,Song, GH,et al. Microstructure and hardness of chromium oxide coatings by arc ion plating[J]. ACTA METALLURGICA SINICA,2003,39(9):979-983. |
APA | Ji, AL,Wang, W,Song, GH,Wang, AY,Sin, C,&Wen, LS.(2003).Microstructure and hardness of chromium oxide coatings by arc ion plating.ACTA METALLURGICA SINICA,39(9),979-983. |
MLA | Ji, AL,et al."Microstructure and hardness of chromium oxide coatings by arc ion plating".ACTA METALLURGICA SINICA 39.9(2003):979-983. |
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