IMR OpenIR
Improvement of tensile strength of CVD SiC fiber
Shi, NL; Luo, K; Zu, YP
Corresponding AuthorShi, NL()
2003
Source PublicationADVANCED MATERIALS PROCESSING II
ISSN0255-5476
Volume437-4Pages:73-76
AbstractA thin film Of SiO2 was formed on the surface of CVD SiC fiber by electrochemical treatment. The tensile strength of the fiber was increased effectively. The formation of the thin film of SiO2 heals the surface defects and makes the surface of the SiC fiber relatively smooth. The SiO2 film also creates a compression stress on the surface of the fiber, which can alleviate the locally concentrated tension and the surface damage sensitivity. Moreover, it can also cause an additional energy consumption to overcome the surface compressive stress during tensile loading of SiC fiber.
Keywordelectrochemical methods SiC fiber surface treatment tensile strength
Indexed BySCI
Language英语
WOS Research AreaMaterials Science
WOS SubjectMaterials Science, Multidisciplinary ; Materials Science, Characterization & Testing ; Materials Science, Coatings & Films ; Materials Science, Composites
WOS IDWOS:000185937400015
PublisherTRANS TECH PUBLICATIONS LTD
Citation statistics
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/117640
Collection中国科学院金属研究所
Corresponding AuthorShi, NL
AffiliationChinese Acad Sci, Inst Met Res, Shenyang 110016, Peoples R China
Recommended Citation
GB/T 7714
Shi, NL,Luo, K,Zu, YP. Improvement of tensile strength of CVD SiC fiber[J]. ADVANCED MATERIALS PROCESSING II,2003,437-4:73-76.
APA Shi, NL,Luo, K,&Zu, YP.(2003).Improvement of tensile strength of CVD SiC fiber.ADVANCED MATERIALS PROCESSING II,437-4,73-76.
MLA Shi, NL,et al."Improvement of tensile strength of CVD SiC fiber".ADVANCED MATERIALS PROCESSING II 437-4(2003):73-76.
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