| Study of Al-O-N and Cr-O-N films deposited by arc ion plating as diffusion barriers |
| Wang, QM; Wu, YN; Ji, AL; Ke, PL; Sun, C; Huang, RF; Wen, LS
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| 通讯作者 | Wang, QM(qmwang@imr.ac.cn)
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| 2004
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| 发表期刊 | ACTA METALLURGICA SINICA
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| ISSN | 0412-1961
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| 卷号 | 40期号:1页码:83-87 |
| 摘要 | Al-O-N and Cr-O-N thin films were deposited on superalloy DSM11 by arc ion plating (AIP). The effects of flow rates of oxygen and nitrogen on phase composition and the interdiffusion of various elements at high temperature between DSM11 substrate and NiCoCrAlY coating were studied in the systems of DSM11/NiCoCrAlY, DSM11/Al-O-N/NiCoCrAlY and DSM11/Cr-O-N/NiCoCrAlY. The results indicate that the Al(Cr)-O-N films are polycrystalline with phase constitution of alpha-Al2O3 + hexagonal AIN or Cr2O3+CrN, respectively. The relative intensity of AIN to Al2O3 or CrN to Cr2O3 is changed with the change of flow rates of oxygen and nitrogen. After oxidation at 1050 degreesC for 100 h, Al-O-N hindered the interdiffusion of elements between DSM11 and NiCoCrAlY more effectively than Cr-O-N film. The diffusion barrier layers hardly influenced the oxidation kinetics of the NiCoCrAlY coating. |
| 关键词 | Al-O-N
Cr-O-N
diffusion barrier layer
arc ion plating (AIP)
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| 收录类别 | SCI
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| 语种 | 英语
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| WOS研究方向 | Metallurgy & Metallurgical Engineering
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| WOS类目 | Metallurgy & Metallurgical Engineering
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| WOS记录号 | WOS:000189379800016
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| 出版者 | SCIENCE CHINA PRESS
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| 引用统计 |
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| 文献类型 | 期刊论文
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| 条目标识符 | http://ir.imr.ac.cn/handle/321006/118541
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| 专题 | 中国科学院金属研究所
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| 通讯作者 | Wang, QM |
| 作者单位 | Chinese Acad Sci, Inst Met Res, State Key Lab Corros & Protect, Shenyang 110016, Peoples R China
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推荐引用方式
GB/T 7714 |
Wang, QM,Wu, YN,Ji, AL,et al. Study of Al-O-N and Cr-O-N films deposited by arc ion plating as diffusion barriers[J]. ACTA METALLURGICA SINICA,2004,40(1):83-87.
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| APA |
Wang, QM.,Wu, YN.,Ji, AL.,Ke, PL.,Sun, C.,...&Wen, LS.(2004).Study of Al-O-N and Cr-O-N films deposited by arc ion plating as diffusion barriers.ACTA METALLURGICA SINICA,40(1),83-87.
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| MLA |
Wang, QM,et al."Study of Al-O-N and Cr-O-N films deposited by arc ion plating as diffusion barriers".ACTA METALLURGICA SINICA 40.1(2004):83-87.
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