IMR OpenIR
Investigations of helium incorporated into a film deposited by magnetron sputtering
Liu, Chao-Zhuo; Shi, L. Q.; Zhou, Z. Y.; Hao, X. P.; Wang, B. Y.; Liu, S.; Wang, L. B.
Corresponding AuthorLiu, Chao-Zhuo(czliu@fudan.edu.cn)
2007-04-07
Source PublicationJOURNAL OF PHYSICS D-APPLIED PHYSICS
ISSN0022-3727
Volume40Issue:7Pages:2150-2156
AbstractHelium-containing titanium film was prepared by magnetron sputtering in a gas mixture of helium and argon. This method distinctly differs from traditional helium introduction into metals. A high concentration of helium up to 45 at.% and a uniform distribution in the bulk were shown by ion beam analysis. The process of helium incorporation is considered in which the helium particles are energetically backscattered from the target, fly through the glow discharge zone and are consequently embedded into the growing film. It is virtually a continuous sub-threshold-energy implantation during film deposition based on the plasma technique. The limited partial pressure of argon is to maintain the discharge and sputter the titanium target. The helium content incorporated can be controlled conveniently by adjusting the pressure of the working gases. X-ray diffraction, transmission electron microscopy, Doppler broadening of positron beam analysis and thermal helium desorption spectroscopy revealed the microstructure of titanium films, the state of helium bubbles, the defect characteristic related to helium and thermal release behaviour of helium from the titanium film.
DOI10.1088/0022-3727/40/7/044
Indexed BySCI
Language英语
WOS Research AreaPhysics
WOS SubjectPhysics, Applied
WOS IDWOS:000245301300044
PublisherIOP PUBLISHING LTD
Citation statistics
Cited Times:20[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/126143
Collection中国科学院金属研究所
Corresponding AuthorLiu, Chao-Zhuo
Affiliation1.Fudan Univ, Inst Modern Phys, Shanghai, Peoples R China
2.Chinese Acad Sci, Inst High Energy Phys, Beijing, Peoples R China
3.Chinese Acad Sci, Inst Phys Met, Shenyang, Peoples R China
Recommended Citation
GB/T 7714
Liu, Chao-Zhuo,Shi, L. Q.,Zhou, Z. Y.,et al. Investigations of helium incorporated into a film deposited by magnetron sputtering[J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS,2007,40(7):2150-2156.
APA Liu, Chao-Zhuo.,Shi, L. Q..,Zhou, Z. Y..,Hao, X. P..,Wang, B. Y..,...&Wang, L. B..(2007).Investigations of helium incorporated into a film deposited by magnetron sputtering.JOURNAL OF PHYSICS D-APPLIED PHYSICS,40(7),2150-2156.
MLA Liu, Chao-Zhuo,et al."Investigations of helium incorporated into a film deposited by magnetron sputtering".JOURNAL OF PHYSICS D-APPLIED PHYSICS 40.7(2007):2150-2156.
Files in This Item:
There are no files associated with this item.
Related Services
Recommend this item
Bookmark
Usage statistics
Export to Endnote
Google Scholar
Similar articles in Google Scholar
[Liu, Chao-Zhuo]'s Articles
[Shi, L. Q.]'s Articles
[Zhou, Z. Y.]'s Articles
Baidu academic
Similar articles in Baidu academic
[Liu, Chao-Zhuo]'s Articles
[Shi, L. Q.]'s Articles
[Zhou, Z. Y.]'s Articles
Bing Scholar
Similar articles in Bing Scholar
[Liu, Chao-Zhuo]'s Articles
[Shi, L. Q.]'s Articles
[Zhou, Z. Y.]'s Articles
Terms of Use
No data!
Social Bookmark/Share
All comments (0)
No comment.
 

Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.