Investigations of helium incorporated into a film deposited by magnetron sputtering

doi:10.1088/0022-3727/40/7/044

IMR OpenIR

	Investigations of helium incorporated into a film deposited by magnetron sputtering
	Liu, Chao-Zhuo ; Shi, L. Q.; Zhou, Z. Y.; Hao, X. P.; Wang, B. Y.; Liu, S.; Wang, L. B.
通讯作者	Liu, Chao-Zhuo(czliu@fudan.edu.cn)
	2007-04-07
发表期刊	JOURNAL OF PHYSICS D-APPLIED PHYSICS
ISSN	0022-3727
卷号	40 期号:7 页码:2150-2156
摘要	Helium-containing titanium film was prepared by magnetron sputtering in a gas mixture of helium and argon. This method distinctly differs from traditional helium introduction into metals. A high concentration of helium up to 45 at.% and a uniform distribution in the bulk were shown by ion beam analysis. The process of helium incorporation is considered in which the helium particles are energetically backscattered from the target, fly through the glow discharge zone and are consequently embedded into the growing film. It is virtually a continuous sub-threshold-energy implantation during film deposition based on the plasma technique. The limited partial pressure of argon is to maintain the discharge and sputter the titanium target. The helium content incorporated can be controlled conveniently by adjusting the pressure of the working gases. X-ray diffraction, transmission electron microscopy, Doppler broadening of positron beam analysis and thermal helium desorption spectroscopy revealed the microstructure of titanium films, the state of helium bubbles, the defect characteristic related to helium and thermal release behaviour of helium from the titanium film.
DOI	10.1088/0022-3727/40/7/044
收录类别	SCI
语种	英语
WOS研究方向	Physics
WOS类目	Physics, Applied
WOS记录号	WOS:000245301300044
出版者	IOP PUBLISHING LTD
引用统计	被引频次：25[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/126143
专题	中国科学院金属研究所
通讯作者	Liu, Chao-Zhuo
作者单位	1.Fudan Univ, Inst Modern Phys, Shanghai, Peoples R China 2.Chinese Acad Sci, Inst High Energy Phys, Beijing, Peoples R China 3.Chinese Acad Sci, Inst Phys Met, Shenyang, Peoples R China
推荐引用方式 GB/T 7714	Liu, Chao-Zhuo,Shi, L. Q.,Zhou, Z. Y.,et al. Investigations of helium incorporated into a film deposited by magnetron sputtering[J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS,2007,40(7):2150-2156.
APA	Liu, Chao-Zhuo.,Shi, L. Q..,Zhou, Z. Y..,Hao, X. P..,Wang, B. Y..,...&Wang, L. B..(2007).Investigations of helium incorporated into a film deposited by magnetron sputtering.JOURNAL OF PHYSICS D-APPLIED PHYSICS,40(7),2150-2156.
MLA	Liu, Chao-Zhuo,et al."Investigations of helium incorporated into a film deposited by magnetron sputtering".JOURNAL OF PHYSICS D-APPLIED PHYSICS 40.7(2007):2150-2156.