Effect of Substrate Pulse Bias Voltage on the Microstructure and Mechanical and Wear-resistant Properties of TiN/Cu Nanocomposite Films | |
Zhao Yanhui1; Zhao Shengsheng2; Ren Ling1; Denisov, V. V.3; Koval, N. N.3; Yang Ke1; Yu Baohai1 | |
通讯作者 | Zhao Yanhui(yhzhao@imr.ac.cn) |
2018-11-01 | |
发表期刊 | RARE METAL MATERIALS AND ENGINEERING
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ISSN | 1002-185X |
卷号 | 47期号:11页码:3284-3288 |
摘要 | TiN/Cu nanocomposite films were deposited on high-speed steel (HSS) substrates by axial magnetic field-enhanced arc ion plating (AMFE-AIP). The effects of substrate bias voltage on chemical composition, microstructure, mechanical and tribological properties of the films were investigated by X-ray photoelectrons spectroscopy (XPS), X-ray diffraction (XRD), nanoindentation and wear measurements, respectively. The results show that the Cu content increases first and then decreases with the increase of the pulse bias voltage, being a low value in the range of 1.3 at%similar to 2.1 at%. XRD results show that only the TiN phase appears in all the films, and no Cu phase is observed. The preferred orientation of the films changes significantly with the increasing pulse bias voltage. A maximum value of hardness of 36 GPa is obtained under a pulse bias voltage of -200 V, corresponding to the film containing 1.6 at% Cu. Compared to the pure TiN film, the Cu addition in TiN films significantly improves the wear resistance. |
关键词 | arc ion plating magnetic field pulse bias microstructure mechanical property |
资助者 | National Natural Science Foundation of China |
收录类别 | SCI |
语种 | 英语 |
资助项目 | National Natural Science Foundation of China[51401128] |
WOS研究方向 | Materials Science ; Metallurgy & Metallurgical Engineering |
WOS类目 | Materials Science, Multidisciplinary ; Metallurgy & Metallurgical Engineering |
WOS记录号 | WOS:000452694200006 |
出版者 | NORTHWEST INST NONFERROUS METAL RESEARCH |
引用统计 | |
文献类型 | 期刊论文 |
条目标识符 | http://ir.imr.ac.cn/handle/321006/130760 |
专题 | 中国科学院金属研究所 |
通讯作者 | Zhao Yanhui |
作者单位 | 1.Chinese Acad Sci, Inst Met Res, Shenyang 110016, Liaoning, Peoples R China 2.Shenzhen Polytech, Sch Mech & Elect Engn, Shenzhen 518055, Peoples R China 3.Russian Acad Sci, Inst High Current Elect, Siberian Branch, Tomsk 634055, Russia |
推荐引用方式 GB/T 7714 | Zhao Yanhui,Zhao Shengsheng,Ren Ling,et al. Effect of Substrate Pulse Bias Voltage on the Microstructure and Mechanical and Wear-resistant Properties of TiN/Cu Nanocomposite Films[J]. RARE METAL MATERIALS AND ENGINEERING,2018,47(11):3284-3288. |
APA | Zhao Yanhui.,Zhao Shengsheng.,Ren Ling.,Denisov, V. V..,Koval, N. N..,...&Yu Baohai.(2018).Effect of Substrate Pulse Bias Voltage on the Microstructure and Mechanical and Wear-resistant Properties of TiN/Cu Nanocomposite Films.RARE METAL MATERIALS AND ENGINEERING,47(11),3284-3288. |
MLA | Zhao Yanhui,et al."Effect of Substrate Pulse Bias Voltage on the Microstructure and Mechanical and Wear-resistant Properties of TiN/Cu Nanocomposite Films".RARE METAL MATERIALS AND ENGINEERING 47.11(2018):3284-3288. |
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