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Effect of Substrate Pulse Bias Voltage on the Microstructure and Mechanical and Wear-resistant Properties of TiN/Cu Nanocomposite Films
Zhao Yanhui1; Zhao Shengsheng2; Ren Ling1; Denisov, V. V.3; Koval, N. N.3; Yang Ke1; Yu Baohai1
Corresponding AuthorZhao Yanhui(yhzhao@imr.ac.cn)
2018-11-01
Source PublicationRARE METAL MATERIALS AND ENGINEERING
ISSN1002-185X
Volume47Issue:11Pages:3284-3288
AbstractTiN/Cu nanocomposite films were deposited on high-speed steel (HSS) substrates by axial magnetic field-enhanced arc ion plating (AMFE-AIP). The effects of substrate bias voltage on chemical composition, microstructure, mechanical and tribological properties of the films were investigated by X-ray photoelectrons spectroscopy (XPS), X-ray diffraction (XRD), nanoindentation and wear measurements, respectively. The results show that the Cu content increases first and then decreases with the increase of the pulse bias voltage, being a low value in the range of 1.3 at%similar to 2.1 at%. XRD results show that only the TiN phase appears in all the films, and no Cu phase is observed. The preferred orientation of the films changes significantly with the increasing pulse bias voltage. A maximum value of hardness of 36 GPa is obtained under a pulse bias voltage of -200 V, corresponding to the film containing 1.6 at% Cu. Compared to the pure TiN film, the Cu addition in TiN films significantly improves the wear resistance.
Keywordarc ion plating magnetic field pulse bias microstructure mechanical property
Funding OrganizationNational Natural Science Foundation of China
Indexed BySCI
Language英语
Funding ProjectNational Natural Science Foundation of China[51401128]
WOS Research AreaMaterials Science ; Metallurgy & Metallurgical Engineering
WOS SubjectMaterials Science, Multidisciplinary ; Metallurgy & Metallurgical Engineering
WOS IDWOS:000452694200006
PublisherNORTHWEST INST NONFERROUS METAL RESEARCH
Citation statistics
Cited Times:1[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/130760
Collection中国科学院金属研究所
Corresponding AuthorZhao Yanhui
Affiliation1.Chinese Acad Sci, Inst Met Res, Shenyang 110016, Liaoning, Peoples R China
2.Shenzhen Polytech, Sch Mech & Elect Engn, Shenzhen 518055, Peoples R China
3.Russian Acad Sci, Inst High Current Elect, Siberian Branch, Tomsk 634055, Russia
Recommended Citation
GB/T 7714
Zhao Yanhui,Zhao Shengsheng,Ren Ling,et al. Effect of Substrate Pulse Bias Voltage on the Microstructure and Mechanical and Wear-resistant Properties of TiN/Cu Nanocomposite Films[J]. RARE METAL MATERIALS AND ENGINEERING,2018,47(11):3284-3288.
APA Zhao Yanhui.,Zhao Shengsheng.,Ren Ling.,Denisov, V. V..,Koval, N. N..,...&Yu Baohai.(2018).Effect of Substrate Pulse Bias Voltage on the Microstructure and Mechanical and Wear-resistant Properties of TiN/Cu Nanocomposite Films.RARE METAL MATERIALS AND ENGINEERING,47(11),3284-3288.
MLA Zhao Yanhui,et al."Effect of Substrate Pulse Bias Voltage on the Microstructure and Mechanical and Wear-resistant Properties of TiN/Cu Nanocomposite Films".RARE METAL MATERIALS AND ENGINEERING 47.11(2018):3284-3288.
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