Thermal Stability of WB2 and W-B-N Films Deposited by Magnetron Sputtering

doi:10.1007/s40195-018-0864-8

IMR OpenIR

	Thermal Stability of WB2 and W-B-N Films Deposited by Magnetron Sputtering
	Liu, Yan-Ming 1; Li, Tong 1; Liu, Feng 1; Pei, Zhi-Liang 2
通讯作者	Pei, Zhi-Liang(zlpei@imr.ac.cn)
	2019
发表期刊	ACTA METALLURGICA SINICA-ENGLISH LETTERS
ISSN	1006-7191
卷号	32 期号:1 页码:136-144
摘要	The work is mainly to study the thermal stability including the phase stability, microstructure and tribo-mechanical properties of the AlB2-type WB2 and W-B-N (5.6at.% N) films annealed in vacuum at various temperatures, which are deposited on Si and GY8 substrates by magnetron sputtering. For the WB2 and W-B-N films deposited on Si wafers, as the annealing temperature increases from 700 to 1000 degrees C, a-WB (700 degrees C) and Mo2B5-type WB2 (1000 degrees C) are successively observed in the AlB2-type WB2 films, which show many cracks at the temperature 800 degrees C resulting in the performance failure; by contrast, only slight -WB is observed at 1000 degrees C in the W-B-N films due to the stabilization effect of a-BN phase, and the hardness increases to 34.1GPa first due to the improved crystallinity and then decreases to 31.5GPa ascribed to the formation of -WB. For the WB2 and the W-B-N films deposited on WC-Co substrates, both the WB2 and W-B-N films react with the YG8 (WC-Co) substrates leading to the formation of CoWB, CoW2B2 and CoW3B3 with the annealing temperature increasing to 900 degrees C; a large number of linear cracks occur on the surface of these two films annealed at 800 degrees C leading to the film failure; after vacuum annealing at 700 degrees C, the friction performance of the W-B-N films is higher than that of the deposited W-B-N films, while the wear resistance of the WB2 films shows a slight decrease compared with that of the deposited WB2 films.
关键词	AlB2-type WB2 films W-B-N films Magnetron sputtering Thermal stability Mechanical properties
资助者	National Natural Science Foundation of China ; Natural Science Foundation of Shaanxi Province of China
DOI	10.1007/s40195-018-0864-8
收录类别	SCI
语种	英语
资助项目	National Natural Science Foundation of China[51701157] ; National Natural Science Foundation of China[51505378] ; Natural Science Foundation of Shaanxi Province of China[2017JQ5031]
WOS研究方向	Metallurgy & Metallurgical Engineering
WOS类目	Metallurgy & Metallurgical Engineering
WOS记录号	WOS:000455515500014
出版者	CHINESE ACAD SCIENCES, INST METAL RESEARCH
引用统计	被引频次：16[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/131263
专题	中国科学院金属研究所
通讯作者	Pei, Zhi-Liang
作者单位	1.Xian Shiyou Univ, Coll Mat Sci & Engn, Xian 710065, Shaanxi, Peoples R China 2.Chinese Acad Sci, Inst Met Res, Shenyang 110016, Liaoning, Peoples R China
推荐引用方式 GB/T 7714	Liu, Yan-Ming,Li, Tong,Liu, Feng,et al. Thermal Stability of WB2 and W-B-N Films Deposited by Magnetron Sputtering[J]. ACTA METALLURGICA SINICA-ENGLISH LETTERS,2019,32(1):136-144.
APA	Liu, Yan-Ming,Li, Tong,Liu, Feng,&Pei, Zhi-Liang.(2019).Thermal Stability of WB2 and W-B-N Films Deposited by Magnetron Sputtering.ACTA METALLURGICA SINICA-ENGLISH LETTERS,32(1),136-144.
MLA	Liu, Yan-Ming,et al."Thermal Stability of WB2 and W-B-N Films Deposited by Magnetron Sputtering".ACTA METALLURGICA SINICA-ENGLISH LETTERS 32.1(2019):136-144.