Influence of modulation period on structure and mechanical properties of WB2/CrN films deposited by direct-current magnetron sputtering | |
Liu, Yanming1; Shi, Wenbo2,3; Tian, Li1; Li, Tong1; Wang, Chen1; Liu, Feng1; Pei, Zhiliang2; Fan, Di2 | |
通讯作者 | Pei, Zhiliang(zlpei@imr.ac.cn) ; Fan, Di(dfan11s@alum.imr.ac.cn) |
2019-06-05 | |
发表期刊 | JOURNAL OF ALLOYS AND COMPOUNDS
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ISSN | 0925-8388 |
卷号 | 788页码:729-738 |
摘要 | WB2/CrN multilayer films with thick modulation periods over 50 nm (Lambda = 1400, 315, 235, 150, 55 nm) were synthesized by direct-current magnetron sputtering, and the influence of modulation period on microstructure and mechanical properties for the multilayer films was systematically studied. In WB2/CrN multilayer films, CrN sublayers present the columnar microstructure. As L decreases, the structure of WB2 sublayers evolves from (110) orientation to (001) orientation to amorphous structure, and critical crystalline thickness for WB2 sublayers is over 150 nm here. A transition layer, which shows the columnar crystal with size of 10-11 nm high and 2.5-3.5 nm wide caused by the effect of the crystalline interface of the CrN sublayers, is detected in WB2 sublayers. Additionally, a-BN, WB2, WB2(N), CrN, Cr2N and Cr2O3 phase are formed in the multilayer films. Moreover, film hardness mainly obeys the rule of mixture. The maximum hardness of 31.2 GPa is obtained at Lambda = 315 nm due to crystalline WB2 sublayers with (001) preferred orientation, and amorphous WB2 sublayers greatly reduce the film hardness to only 22.3-24.3 GPa at Lambda < 235 nm. Consequently, the poor hardness leads to the higher wear rates (5.7-7.8 x 10(-7) mm(3)/mN) of multilayer films with Lambda <= 235 nm compared with those (2.9-3.3 x 10(-7) mm(3)/mN) of other films. However, both the fracture toughness and adhesive strength of the films present an increasing trend with decreasing Lambda, resulting from the soft CrN and BN phases and a certain amount of interface. In conclusion, decreasing the critical crystal-thickness of the WB2 sublayers, controlling the N content in WB2 sublayers and getting sharp interfaces will play important roles in developing the higher-performance WB2/CrN multilayer films. (C) 2019 Elsevier B.V. All rights reserved. |
关键词 | Magnetron sputtering WB2/CrN multilayers Thick modulation period Mechanical properties |
资助者 | Natural Science Foundation of China ; Natural Science Foundation of Shaanxi Province of China |
DOI | 10.1016/j.jallcom.2019.02.188 |
收录类别 | SCI |
语种 | 英语 |
资助项目 | Natural Science Foundation of China[51701157] ; Natural Science Foundation of China[51704239] ; Natural Science Foundation of Shaanxi Province of China[2017JQ5031] ; Natural Science Foundation of Shaanxi Province of China[2017JM5101] ; Natural Science Foundation of Shaanxi Province of China[2018JQ5108] |
WOS研究方向 | Chemistry ; Materials Science ; Metallurgy & Metallurgical Engineering |
WOS类目 | Chemistry, Physical ; Materials Science, Multidisciplinary ; Metallurgy & Metallurgical Engineering |
WOS记录号 | WOS:000462767000086 |
出版者 | ELSEVIER SCIENCE SA |
引用统计 | |
文献类型 | 期刊论文 |
条目标识符 | http://ir.imr.ac.cn/handle/321006/132559 |
专题 | 中国科学院金属研究所 |
通讯作者 | Pei, Zhiliang; Fan, Di |
作者单位 | 1.Xian Shiyou Univ, Coll Mat Sci & Engn, Xian 710065, Shaanxi, Peoples R China 2.Chinese Acad Sci, Inst Met Res, Shenyang 110016, Liaoning, Peoples R China 3.Univ Sci & Technol China, Dept Mat Sci & Engn, Shenyang 110016, Liaoning, Peoples R China |
推荐引用方式 GB/T 7714 | Liu, Yanming,Shi, Wenbo,Tian, Li,et al. Influence of modulation period on structure and mechanical properties of WB2/CrN films deposited by direct-current magnetron sputtering[J]. JOURNAL OF ALLOYS AND COMPOUNDS,2019,788:729-738. |
APA | Liu, Yanming.,Shi, Wenbo.,Tian, Li.,Li, Tong.,Wang, Chen.,...&Fan, Di.(2019).Influence of modulation period on structure and mechanical properties of WB2/CrN films deposited by direct-current magnetron sputtering.JOURNAL OF ALLOYS AND COMPOUNDS,788,729-738. |
MLA | Liu, Yanming,et al."Influence of modulation period on structure and mechanical properties of WB2/CrN films deposited by direct-current magnetron sputtering".JOURNAL OF ALLOYS AND COMPOUNDS 788(2019):729-738. |
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