Ultrafast Transition of Nonuniform Graphene to High-Quality Uniform Monolayer Films on Liquid Cu

doi:10.1021/acsami.9b01137

IMR OpenIR

	Ultrafast Transition of Nonuniform Graphene to High-Quality Uniform Monolayer Films on Liquid Cu
	Xin, Xing 1,2; Xu, Chuan 1; Zhang, Dingdong 1,3; Liu, Zhibo 1; Ma, Wei 1,3; Qian, Xitan 1,3; Chen, Mao-Lin 1,3; Du, Jinhong 1,3; Cheng, Hui-Ming 1,3,4; Ren, Wencai 1,3
通讯作者	Cheng, Hui-Ming(cheng@imr.ac.cn) ; Ren, Wencai(wcren@imr.ac.cn)
	2019-05-15
发表期刊	ACS APPLIED MATERIALS & INTERFACES
ISSN	1944-8244
卷号	11 期号:19 页码:17629-17636
摘要	It is essentially important to synthesize uniform graphene films with a controlled number of layers because their properties strongly depend on the number of layers. Although chemical vapor deposition (CVD) on Cu has been widely used to synthesize large-area graphene films, the growth on solid and liquid Cu (L-Cu) suffers from poor thickness uniformity with a great number of adlayers and difficulty in forming continuous films even after a long growth time of hours, respectively. Here, we found that nonuniform graphene films initially grown on solid Cu (S-Cu) foil can rapidly transform into continuously uniform monolayer graphene film on L-Cu within 3 min. Moreover, the films obtained show larger grain size, higher quality, electrical properties, and better performance in organic light-emitting diode applications than the original films grown on S-Cu foil. By using carbon isotope labeling, we revealed that the multilayer-to-monolayer transition of graphene on L-Cu experiences etching-"self-aligning"-coalescence processes. This two-step CVD method not only opens up a new way for the rapid growth of uniform monolayer graphene films but also provides helpful information for the controlled growth of uniform monolayers of other 2D materials such as monolayer h-BN.
关键词	graphene 2D material film chemical vapor deposition number of layers
资助者	Ministry of Science and Technology of China ; National Natural Science Foundation of China ; Chinese Academy of Sciences ; Strategic Priority Research Program of Chinese Academy of Sciences ; Youth Innovation Promotion Association of Chinese Academy of Sciences
DOI	10.1021/acsami.9b01137
收录类别	SCI
语种	英语
资助项目	Ministry of Science and Technology of China[2016YFA0200101] ; National Natural Science Foundation of China[51325205] ; National Natural Science Foundation of China[51290273] ; National Natural Science Foundation of China[51521091] ; National Natural Science Foundation of China[51572265] ; National Natural Science Foundation of China[51861135201] ; Chinese Academy of Sciences[KGZD-EW-303-1] ; Chinese Academy of Sciences[KGZD-EW-T06] ; Strategic Priority Research Program of Chinese Academy of Sciences[XDB30000000] ; Youth Innovation Promotion Association of Chinese Academy of Sciences
WOS研究方向	Science & Technology - Other Topics ; Materials Science
WOS类目	Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary
WOS记录号	WOS:000468364500055
出版者	AMER CHEMICAL SOC
引用统计	被引频次：11[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/133486
专题	中国科学院金属研究所
通讯作者	Cheng, Hui-Ming; Ren, Wencai
作者单位	1.Chinese Acad Sci, Shenyang Natl Lab Mat Sci, Inst Met Res, Shenyang 110016, Liaoning, Peoples R China 2.Univ Chinese Acad Sci, Shenyang 110016, Liaoning, Peoples R China 3.Univ Sci & Technol China, Sch Mat Sci & Engn, Shenyang 110016, Liaoning, Peoples R China 4.Tsinghua Univ, TBSI, 1001 Xueyuan Rd, Shenzhen 518055, Peoples R China
推荐引用方式 GB/T 7714	Xin, Xing,Xu, Chuan,Zhang, Dingdong,et al. Ultrafast Transition of Nonuniform Graphene to High-Quality Uniform Monolayer Films on Liquid Cu[J]. ACS APPLIED MATERIALS & INTERFACES,2019,11(19):17629-17636.
APA	Xin, Xing.,Xu, Chuan.,Zhang, Dingdong.,Liu, Zhibo.,Ma, Wei.,...&Ren, Wencai.(2019).Ultrafast Transition of Nonuniform Graphene to High-Quality Uniform Monolayer Films on Liquid Cu.ACS APPLIED MATERIALS & INTERFACES,11(19),17629-17636.
MLA	Xin, Xing,et al."Ultrafast Transition of Nonuniform Graphene to High-Quality Uniform Monolayer Films on Liquid Cu".ACS APPLIED MATERIALS & INTERFACES 11.19(2019):17629-17636.