| Reactive sputter deposition of WO3 films by using two deposition methods | |
| Yasuda, Yoji1; Hoshi, Yoichi1; Kobayashi, Shin-ichi1; Uchida, Takayuki1; Sawada, Yutaka1; Wang, Meihan2; Lei, Hao3 | |
| Corresponding Author | Yasuda, Yoji(yyasuda@em.t-kougei.ac.jp) |
| 2019-05-01 | |
| Source Publication | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
 |
| ISSN | 0734-2101 |
| Volume | 37Issue:3Pages:6 |
| Abstract | Tungsten-trioxide (WO3) films were deposited using two types of sputtering systems: a planar magnetron sputtering system and a facing-target sputtering (FTS) system. The structure and gasochromic properties of the resulting films were compared, and film uniformity and gasochromic properties were found to be significantly improved when using FTS because the incidence of high-energy negative oxygen ions on the substrate during sputtering was significantly suppressed. The authors confirmed that the deposition rate of WO3 films increased by hundreds of times with an increase of the sputtering voltage from 500 to 800 V in the FTS system, and a deposition rate above 100 nm/min was easily achieved. The authors clarified that the deposition rate of the WO3 film strongly depends on the sputtering voltage under the condition of a constant sputtering current. Published by the AVS. |
| DOI | 10.1116/1.5092863 |
| Indexed By | SCI |
| Language | 英语 |
| WOS Research Area | Materials Science ; Physics |
| WOS Subject | Materials Science, Coatings & Films ; Physics, Applied |
| WOS ID | WOS:000472182400032 |
| Publisher | A V S AMER INST PHYSICS |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.imr.ac.cn/handle/321006/134152 |
| Collection | 中国科学院金属研究所 |
| Corresponding Author | Yasuda, Yoji |
| Affiliation | 1.Tokyo Polytech Univ, 1853 Iiyama, Atsugi, Kanagawa 2430297, Japan 2.Shenyang Univ, Sch Mech Engn, Shenyang 110044, Liaoning, Peoples R China 3.Chinese Acad Sci, Inst Met Res, Surface Engn Mat Div, Shenyang 110016, Liaoning, Peoples R China |
| Recommended Citation GB/T 7714 | Yasuda, Yoji,Hoshi, Yoichi,Kobayashi, Shin-ichi,et al. Reactive sputter deposition of WO3 films by using two deposition methods[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,2019,37(3):6. |
| APA | Yasuda, Yoji.,Hoshi, Yoichi.,Kobayashi, Shin-ichi.,Uchida, Takayuki.,Sawada, Yutaka.,...&Lei, Hao.(2019).Reactive sputter deposition of WO3 films by using two deposition methods.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,37(3),6. |
| MLA | Yasuda, Yoji,et al."Reactive sputter deposition of WO3 films by using two deposition methods".JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 37.3(2019):6. |
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