The accelerating nanoscale Kirkendall effect in Co films-native oxide Si (100) system induced by high magnetic fields

doi:10.1016/j.jmst.2019.11.038

IMR OpenIR

	The accelerating nanoscale Kirkendall effect in Co films-native oxide Si (100) system induced by high magnetic fields
	Zhao, Yue 1,2; Wang, Kai 2; Yuan, Shuang 3; Ma, Yonghui 4; Li, Guojian 2; Wang, Qiang 2
通讯作者	Wang, Qiang(wangq@mail.neu.edu.cn)
	2020-06-01
发表期刊	JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY
ISSN	1005-0302
卷号	46 页码:127-135
摘要	The morphology evolution and magnetic properties of Co films-native oxide Si (100) were investigated at 873, 973, and 1073 K in a high magnetic field of 11.5 T. Formation of Kirkendall voids in the Co films was found to cause morphology evolution due to the difference in diffusion flux of Co and Si atoms through the native oxide layer. The high magnetic fields had considerable effect on the morphology evolution by accelerating nanoscale Kirkendall effect. The diffusion mechanism in the presence of high magnetic fields was given to explain the increase of diffusion coefficient. The morphology evolution of Co films on native oxide Si (100) under high magnetic fields during annealing resulted in the magnetic properties variation. (C) 2020 Published by Elsevier Ltd on behalf of The editorial office of Journal of Materials Science & Technology.
关键词	Thin films Annealing Diffusion Kirkendall effect High magnetic field
资助者	National Natural Science Foundation of China ; Liaoning Innovative Research Team in University ; Fundamental Research Funds for the Central Universities
DOI	10.1016/j.jmst.2019.11.038
收录类别	SCI
语种	英语
资助项目	National Natural Science Foundation of China[51425401] ; National Natural Science Foundation of China[51690162] ; Liaoning Innovative Research Team in University[LT2017011] ; Fundamental Research Funds for the Central Universities[N160907001] ; Fundamental Research Funds for the Central Universities[N180915002] ; Fundamental Research Funds for the Central Universities[N180912004]
WOS研究方向	Materials Science ; Metallurgy & Metallurgical Engineering
WOS类目	Materials Science, Multidisciplinary ; Metallurgy & Metallurgical Engineering
WOS记录号	WOS:000525326000013
出版者	JOURNAL MATER SCI TECHNOL
引用统计	被引频次：6[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/138145
专题	中国科学院金属研究所
通讯作者	Wang, Qiang
作者单位	1.Shenzhen Univ, Inst Microscale Optoelect, Shenzhen 518060, Peoples R China 2.Northeastern Univ, Key Lab Electromagnet Proc Mat, Minist Educ, Shenyang 110819, Peoples R China 3.Northeastern Univ, Sch Met, Dept New Energy Sci & Engn, Shenyang 110819, Peoples R China 4.Chinese Acad Sci, Inst Met Res, Shenyang 110016, Peoples R China
推荐引用方式 GB/T 7714	Zhao, Yue,Wang, Kai,Yuan, Shuang,et al. The accelerating nanoscale Kirkendall effect in Co films-native oxide Si (100) system induced by high magnetic fields[J]. JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY,2020,46:127-135.
APA	Zhao, Yue,Wang, Kai,Yuan, Shuang,Ma, Yonghui,Li, Guojian,&Wang, Qiang.(2020).The accelerating nanoscale Kirkendall effect in Co films-native oxide Si (100) system induced by high magnetic fields.JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY,46,127-135.
MLA	Zhao, Yue,et al."The accelerating nanoscale Kirkendall effect in Co films-native oxide Si (100) system induced by high magnetic fields".JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY 46(2020):127-135.