| The accelerating nanoscale Kirkendall effect in Co films-native oxide Si (100) system induced by high magnetic fields | |
| Zhao, Yue1,2; Wang, Kai2; Yuan, Shuang3; Ma, Yonghui4; Li, Guojian2; Wang, Qiang2 | |
| Corresponding Author | Wang, Qiang(wangq@mail.neu.edu.cn) |
| 2020-06-01 | |
| Source Publication | JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY
 |
| ISSN | 1005-0302 |
| Volume | 46Pages:127-135 |
| Abstract | The morphology evolution and magnetic properties of Co films-native oxide Si (100) were investigated at 873, 973, and 1073 K in a high magnetic field of 11.5 T. Formation of Kirkendall voids in the Co films was found to cause morphology evolution due to the difference in diffusion flux of Co and Si atoms through the native oxide layer. The high magnetic fields had considerable effect on the morphology evolution by accelerating nanoscale Kirkendall effect. The diffusion mechanism in the presence of high magnetic fields was given to explain the increase of diffusion coefficient. The morphology evolution of Co films on native oxide Si (100) under high magnetic fields during annealing resulted in the magnetic properties variation. (C) 2020 Published by Elsevier Ltd on behalf of The editorial office of Journal of Materials Science & Technology. |
| Keyword | Thin films Annealing Diffusion Kirkendall effect High magnetic field |
| Funding Organization | National Natural Science Foundation of China ; Liaoning Innovative Research Team in University ; Fundamental Research Funds for the Central Universities |
| DOI | 10.1016/j.jmst.2019.11.038 |
| Indexed By | SCI |
| Language | 英语 |
| Funding Project | National Natural Science Foundation of China[51425401] ; National Natural Science Foundation of China[51690162] ; Liaoning Innovative Research Team in University[LT2017011] ; Fundamental Research Funds for the Central Universities[N160907001] ; Fundamental Research Funds for the Central Universities[N180915002] ; Fundamental Research Funds for the Central Universities[N180912004] |
| WOS Research Area | Materials Science ; Metallurgy & Metallurgical Engineering |
| WOS Subject | Materials Science, Multidisciplinary ; Metallurgy & Metallurgical Engineering |
| WOS ID | WOS:000525326000013 |
| Publisher | JOURNAL MATER SCI TECHNOL |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.imr.ac.cn/handle/321006/138148 |
| Collection | 中国科学院金属研究所 |
| Corresponding Author | Wang, Qiang |
| Affiliation | 1.Shenzhen Univ, Inst Microscale Optoelect, Shenzhen 518060, Peoples R China 2.Northeastern Univ, Key Lab Electromagnet Proc Mat, Minist Educ, Shenyang 110819, Peoples R China 3.Northeastern Univ, Sch Met, Dept New Energy Sci & Engn, Shenyang 110819, Peoples R China 4.Chinese Acad Sci, Inst Met Res, Shenyang 110016, Peoples R China |
| Recommended Citation GB/T 7714 | Zhao, Yue,Wang, Kai,Yuan, Shuang,et al. The accelerating nanoscale Kirkendall effect in Co films-native oxide Si (100) system induced by high magnetic fields[J]. JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY,2020,46:127-135. |
| APA | Zhao, Yue,Wang, Kai,Yuan, Shuang,Ma, Yonghui,Li, Guojian,&Wang, Qiang.(2020).The accelerating nanoscale Kirkendall effect in Co films-native oxide Si (100) system induced by high magnetic fields.JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY,46,127-135. |
| MLA | Zhao, Yue,et al."The accelerating nanoscale Kirkendall effect in Co films-native oxide Si (100) system induced by high magnetic fields".JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY 46(2020):127-135. |
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