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Effect of TiN diffusion barrier on elements interdiffusion behavior of Ni/GH3535 system in LiF-NaF-KF molten salt at 700 degrees C
Wang, Chengxu1,2; Chen, Wei1; Chen, Minghui3; Chen, Demin1; Yang, Ke1; Wang, Fuhui3
Corresponding AuthorChen, Wei(chenwei@imr.ac.cn) ; Chen, Minghui(mhchen@mail.neu.edu.cn)
2020-05-15
Source PublicationJOURNAL OF MATERIALS SCIENCE & TECHNOLOGY
ISSN1005-0302
Volume45Pages:125-132
AbstractA TiN interlayer with high electrical conductivity was prepared between the GH3535 alloy and the Ni coating as a diffusion barrier to elements interdiffusion with the goal of increasing the corrosion resistance of GH3535 alloy in molten FLiNaK salt at 700 degrees C. Results indicated that Ni coating could be directly electroplated on the TiN coated GH3535 alloy without extra conductive transition layer. TiN layer showed excellent thermal and chemical stabilities at elevated temperature in this molten salt system, without phase decomposition. The Ni/TiN composite coating was stable enough to resist corrosion in LiF-NaF-KF molten salt at 700 degrees C. Elements interdiffusion between the substrate and Ni coating could be effectively inhibited and the corrosion resistance of the alloy was greatly enhanced. Besides, the TiN interlayer remained continuous and well adhered to the Ni coating as well as the substrate after corrosion test. (C) 2020 Published by Elsevier Ltd on behalf of The editorial office of Journal of Materials Science & Technology.
KeywordMolten salts Superalloys Composite coating High temperature corrosion
DOI10.1016/j.jmst.2019.11.0231005
Indexed BySCI
Language英语
WOS Research AreaMaterials Science ; Metallurgy & Metallurgical Engineering
WOS SubjectMaterials Science, Multidisciplinary ; Metallurgy & Metallurgical Engineering
WOS IDWOS:000526956200014
PublisherJOURNAL MATER SCI TECHNOL
Citation statistics
Cited Times:1[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/138418
Collection中国科学院金属研究所
Corresponding AuthorChen, Wei; Chen, Minghui
Affiliation1.Chinese Acad Sci, Inst Met Res, Shenyang 110016, Peoples R China
2.Univ Sci & Technol China, Sch Mat Sci & Engn, Shenyang 110016, Peoples R China
3.Northeastern Univ, Shenyang Natl Lab Mat Sci, Shenyang 110819, Peoples R China
Recommended Citation
GB/T 7714
Wang, Chengxu,Chen, Wei,Chen, Minghui,et al. Effect of TiN diffusion barrier on elements interdiffusion behavior of Ni/GH3535 system in LiF-NaF-KF molten salt at 700 degrees C[J]. JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY,2020,45:125-132.
APA Wang, Chengxu,Chen, Wei,Chen, Minghui,Chen, Demin,Yang, Ke,&Wang, Fuhui.(2020).Effect of TiN diffusion barrier on elements interdiffusion behavior of Ni/GH3535 system in LiF-NaF-KF molten salt at 700 degrees C.JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY,45,125-132.
MLA Wang, Chengxu,et al."Effect of TiN diffusion barrier on elements interdiffusion behavior of Ni/GH3535 system in LiF-NaF-KF molten salt at 700 degrees C".JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY 45(2020):125-132.
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