Effect of TiN diffusion barrier on elements interdiffusion behavior of Ni/GH3535 system in LiF-NaF-KF molten salt at 700 degrees C

doi:10.1016/j.jmst.2019.11.0231005

IMR OpenIR

	Effect of TiN diffusion barrier on elements interdiffusion behavior of Ni/GH3535 system in LiF-NaF-KF molten salt at 700 degrees C
	Wang, Chengxu 1,2; Chen, Wei 1; Chen, Minghui 3; Chen, Demin 1; Yang, Ke 1; Wang, Fuhui 3
通讯作者	Chen, Wei(chenwei@imr.ac.cn) ; Chen, Minghui(mhchen@mail.neu.edu.cn)
	2020-05-15
发表期刊	JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY
ISSN	1005-0302
卷号	45 页码:125-132
摘要	A TiN interlayer with high electrical conductivity was prepared between the GH3535 alloy and the Ni coating as a diffusion barrier to elements interdiffusion with the goal of increasing the corrosion resistance of GH3535 alloy in molten FLiNaK salt at 700 degrees C. Results indicated that Ni coating could be directly electroplated on the TiN coated GH3535 alloy without extra conductive transition layer. TiN layer showed excellent thermal and chemical stabilities at elevated temperature in this molten salt system, without phase decomposition. The Ni/TiN composite coating was stable enough to resist corrosion in LiF-NaF-KF molten salt at 700 degrees C. Elements interdiffusion between the substrate and Ni coating could be effectively inhibited and the corrosion resistance of the alloy was greatly enhanced. Besides, the TiN interlayer remained continuous and well adhered to the Ni coating as well as the substrate after corrosion test. (C) 2020 Published by Elsevier Ltd on behalf of The editorial office of Journal of Materials Science & Technology.
关键词	Molten salts Superalloys Composite coating High temperature corrosion
DOI	10.1016/j.jmst.2019.11.0231005
收录类别	SCI
语种	英语
WOS研究方向	Materials Science ; Metallurgy & Metallurgical Engineering
WOS类目	Materials Science, Multidisciplinary ; Metallurgy & Metallurgical Engineering
WOS记录号	WOS:000526956200014
出版者	JOURNAL MATER SCI TECHNOL
引用统计	被引频次：14[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/138418
专题	中国科学院金属研究所
通讯作者	Chen, Wei; Chen, Minghui
作者单位	1.Chinese Acad Sci, Inst Met Res, Shenyang 110016, Peoples R China 2.Univ Sci & Technol China, Sch Mat Sci & Engn, Shenyang 110016, Peoples R China 3.Northeastern Univ, Shenyang Natl Lab Mat Sci, Shenyang 110819, Peoples R China
推荐引用方式 GB/T 7714	Wang, Chengxu,Chen, Wei,Chen, Minghui,et al. Effect of TiN diffusion barrier on elements interdiffusion behavior of Ni/GH3535 system in LiF-NaF-KF molten salt at 700 degrees C[J]. JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY,2020,45:125-132.
APA	Wang, Chengxu,Chen, Wei,Chen, Minghui,Chen, Demin,Yang, Ke,&Wang, Fuhui.(2020).Effect of TiN diffusion barrier on elements interdiffusion behavior of Ni/GH3535 system in LiF-NaF-KF molten salt at 700 degrees C.JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY,45,125-132.
MLA	Wang, Chengxu,et al."Effect of TiN diffusion barrier on elements interdiffusion behavior of Ni/GH3535 system in LiF-NaF-KF molten salt at 700 degrees C".JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY 45(2020):125-132.