Synthesis of Ultrahigh-Quality Monolayer Molybdenum Disulfide through In Situ Defect Healing with Thiol Molecules

doi:10.1002/smll.202003357

IMR OpenIR

	Synthesis of Ultrahigh-Quality Monolayer Molybdenum Disulfide through In Situ Defect Healing with Thiol Molecules
	Feng, Simin 1; Tan, Junyang 1; Zhao, Shilong 1; Zhang, Shuqing 1; Khan, Usman 1; Tang, Lei 1; Zou, Xiaolong 1; Lin, Junhao 2; Cheng, Hui-Ming 1,3; Liu, Bilu 1
通讯作者	Cheng, Hui-Ming(hmcheng@sz.tsinghua.edu.cn) ; Liu, Bilu(bilu.liu@sz.tsinghua.edu.cn)
	2020-08-02
发表期刊	SMALL
ISSN	1613-6810
页码	9
摘要	Monolayer transition metal dichalcogenides are 2D materials with many potential applications. Chemical vapor deposition (CVD) is a promising method to synthesize these materials. However, CVD-grown materials generally have poorer quality than mechanically exfoliated ones and contain more defects due to the difficulties in controlling precursors' distribution and concentration during growth where solid precursors are used. Here, thiol is proposed to be used as a liquid precursor for CVD growth of high quality and uniform 2D MoS2. Atomic-resolved structure characterizations indicate that the concentration of sulfur vacancies in the MoS(2)grown from thiol is the lowest among all reported CVD samples. Low temperature spectroscopic characterization further reveals the ultrahigh optical quality of the grown MoS2. Density functional theory simulations indicate that thiol molecules could interact with sulfur vacancies in MoS(2)and repair these defects during the growth of MoS2, resulting in high-quality MoS2. This work provides a facile and controllable method for the growth of high-quality 2D materials with ultralow sulfur vacancies and high optical quality, which will benefit their optoelectronic applications.
关键词	2D materials chemical vapor deposition molybdenum disulfide sulfur vacancy thiol molecules
资助者	NSFC ; Guangdong Innovative and Entrepreneurial Research Team Program ; Guandong International Science Collaboration Project ; Bureau of Industry and Information Technology of Shenzhen ; Shenzhen Basic Research Project
DOI	10.1002/smll.202003357
收录类别	SCI
语种	英语
资助项目	NSFC[51722206] ; NSFC[51991340] ; NSFC[51991343] ; NSFC[51950410577] ; NSFC[11974156] ; NSFC[51920105002] ; Guangdong Innovative and Entrepreneurial Research Team Program[2017ZT07C341] ; Guandong International Science Collaboration Project[2019A050510001] ; Bureau of Industry and Information Technology of Shenzhen[201901171523] ; Shenzhen Basic Research Project[JCYJ20190809180605522] ; Shenzhen Basic Research Project[JCYJ20170407155608882]
WOS研究方向	Chemistry ; Science & Technology - Other Topics ; Materials Science ; Physics
WOS类目	Chemistry, Multidisciplinary ; Chemistry, Physical ; Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Physics, Applied ; Physics, Condensed Matter
WOS记录号	WOS:000554477300001
出版者	WILEY-V C H VERLAG GMBH
引用统计	被引频次：53[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/140037
专题	中国科学院金属研究所
通讯作者	Cheng, Hui-Ming; Liu, Bilu
作者单位	1.Tsinghua Univ, Shenzhen Geim Graphene Ctr, Tsinghua Berkeley Shenzhen Inst & Tsinghua Shenzh, Int Grad Sch, Shenzhen 518055, Peoples R China 2.Southern Univ Sci & Technol, Dept Phys, Shenzhen Key Lab Adv Quantum Funct Mat & Devices, Shenzhen 518055, Peoples R China 3.Chinese Acad Sci, Inst Met Res, Shenyang Natl Lab Mat Sci, Shenyang 110016, Peoples R China
推荐引用方式 GB/T 7714	Feng, Simin,Tan, Junyang,Zhao, Shilong,et al. Synthesis of Ultrahigh-Quality Monolayer Molybdenum Disulfide through In Situ Defect Healing with Thiol Molecules[J]. SMALL,2020:9.
APA	Feng, Simin.,Tan, Junyang.,Zhao, Shilong.,Zhang, Shuqing.,Khan, Usman.,...&Liu, Bilu.(2020).Synthesis of Ultrahigh-Quality Monolayer Molybdenum Disulfide through In Situ Defect Healing with Thiol Molecules.SMALL,9.
MLA	Feng, Simin,et al."Synthesis of Ultrahigh-Quality Monolayer Molybdenum Disulfide through In Situ Defect Healing with Thiol Molecules".SMALL (2020):9.