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Synthesis of Ultrahigh-Quality Monolayer Molybdenum Disulfide through In Situ Defect Healing with Thiol Molecules
Feng, Simin1; Tan, Junyang1; Zhao, Shilong1; Zhang, Shuqing1; Khan, Usman1; Tang, Lei1; Zou, Xiaolong1; Lin, Junhao2; Cheng, Hui-Ming1,3; Liu, Bilu1
Corresponding AuthorCheng, Hui-Ming(hmcheng@sz.tsinghua.edu.cn) ; Liu, Bilu(bilu.liu@sz.tsinghua.edu.cn)
2020-08-02
Source PublicationSMALL
ISSN1613-6810
Pages9
AbstractMonolayer transition metal dichalcogenides are 2D materials with many potential applications. Chemical vapor deposition (CVD) is a promising method to synthesize these materials. However, CVD-grown materials generally have poorer quality than mechanically exfoliated ones and contain more defects due to the difficulties in controlling precursors' distribution and concentration during growth where solid precursors are used. Here, thiol is proposed to be used as a liquid precursor for CVD growth of high quality and uniform 2D MoS2. Atomic-resolved structure characterizations indicate that the concentration of sulfur vacancies in the MoS(2)grown from thiol is the lowest among all reported CVD samples. Low temperature spectroscopic characterization further reveals the ultrahigh optical quality of the grown MoS2. Density functional theory simulations indicate that thiol molecules could interact with sulfur vacancies in MoS(2)and repair these defects during the growth of MoS2, resulting in high-quality MoS2. This work provides a facile and controllable method for the growth of high-quality 2D materials with ultralow sulfur vacancies and high optical quality, which will benefit their optoelectronic applications.
Keyword2D materials chemical vapor deposition molybdenum disulfide sulfur vacancy thiol molecules
Funding OrganizationNSFC ; Guangdong Innovative and Entrepreneurial Research Team Program ; Guandong International Science Collaboration Project ; Bureau of Industry and Information Technology of Shenzhen ; Shenzhen Basic Research Project
DOI10.1002/smll.202003357
Indexed BySCI
Language英语
Funding ProjectNSFC[51722206] ; NSFC[51991340] ; NSFC[51991343] ; NSFC[51950410577] ; NSFC[11974156] ; NSFC[51920105002] ; Guangdong Innovative and Entrepreneurial Research Team Program[2017ZT07C341] ; Guandong International Science Collaboration Project[2019A050510001] ; Bureau of Industry and Information Technology of Shenzhen[201901171523] ; Shenzhen Basic Research Project[JCYJ20190809180605522] ; Shenzhen Basic Research Project[JCYJ20170407155608882]
WOS Research AreaChemistry ; Science & Technology - Other Topics ; Materials Science ; Physics
WOS SubjectChemistry, Multidisciplinary ; Chemistry, Physical ; Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Physics, Applied ; Physics, Condensed Matter
WOS IDWOS:000554477300001
PublisherWILEY-V C H VERLAG GMBH
Citation statistics
Cited Times:4[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/140037
Collection中国科学院金属研究所
Corresponding AuthorCheng, Hui-Ming; Liu, Bilu
Affiliation1.Tsinghua Univ, Shenzhen Geim Graphene Ctr, Tsinghua Berkeley Shenzhen Inst & Tsinghua Shenzh, Int Grad Sch, Shenzhen 518055, Peoples R China
2.Southern Univ Sci & Technol, Dept Phys, Shenzhen Key Lab Adv Quantum Funct Mat & Devices, Shenzhen 518055, Peoples R China
3.Chinese Acad Sci, Inst Met Res, Shenyang Natl Lab Mat Sci, Shenyang 110016, Peoples R China
Recommended Citation
GB/T 7714
Feng, Simin,Tan, Junyang,Zhao, Shilong,et al. Synthesis of Ultrahigh-Quality Monolayer Molybdenum Disulfide through In Situ Defect Healing with Thiol Molecules[J]. SMALL,2020:9.
APA Feng, Simin.,Tan, Junyang.,Zhao, Shilong.,Zhang, Shuqing.,Khan, Usman.,...&Liu, Bilu.(2020).Synthesis of Ultrahigh-Quality Monolayer Molybdenum Disulfide through In Situ Defect Healing with Thiol Molecules.SMALL,9.
MLA Feng, Simin,et al."Synthesis of Ultrahigh-Quality Monolayer Molybdenum Disulfide through In Situ Defect Healing with Thiol Molecules".SMALL (2020):9.
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