The reflectance of the TiO2 films, grown by D C reactive magnetron sputtering on silicon substrates, was studied. The results show that TiO2 films can be good anti-reflectance materials in solar cells and that judicious choice of the film growth conditions may improve its anti-reflectance. The optimized growth conditions are as follows：total gas pressure 2 ×10^-1 Pa,oxygen flow rate, 15 sccm,substrate temperature,60℃ and substrate-target separation, 190 mm.
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