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纳米非晶Si3N4粉的超高压低温烧结
李亚利; 梁勇; 佟百运; 郑丰; 马贤峰; 崔硕景; 赵伟
1997
Source Publication材料研究学报
ISSN1005-3093
Volume11.0Issue:005Pages:473-478
Abstract用六面顶超高压在1.0-5.0GPa,25-1500℃条件下烧结激光法制备的纳米非晶Si3N4粉,有“冷烧结”特性。表现为:在5GPa,室温下压制的块体密度达理论值的93%,这是高压下纳米粒子产生流变的结果。
Keyword纳米材料 陶瓷材料 非晶 烧结 激光法
Indexed ByCSCD
Language中文
CSCD IDCSCD:360949
Citation statistics
Cited Times:7[CSCD]   [CSCD Record]
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/144689
Collection中国科学院金属研究所
Affiliation中国科学院金属研究所
Recommended Citation
GB/T 7714
李亚利,梁勇,佟百运,等. 纳米非晶Si3N4粉的超高压低温烧结[J]. 材料研究学报,1997,11.0(005):473-478.
APA 李亚利.,梁勇.,佟百运.,郑丰.,马贤峰.,...&赵伟.(1997).纳米非晶Si3N4粉的超高压低温烧结.材料研究学报,11.0(005),473-478.
MLA 李亚利,et al."纳米非晶Si3N4粉的超高压低温烧结".材料研究学报 11.0.005(1997):473-478.
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