PHOTOCATALYTIC PROPERTIES OF TiO2 THIN FILMS PREPARED BY MICROARC OXIDATION AND DOPING ELECTROLYTES | |
其他题名 | PHOTOCATALYTIC PROPERTIES OF TiO_2 THIN FILMS PREPARED BY MICROARC OXIDATION AND DOPING ELECTROLYTES |
Shao Zhongcai1; Li Xiaodan2; Su Huidong1; Wei Shouqiang1; Zhai Yuchun2 | |
2008 | |
发表期刊 | ACTA METALLURGICA SINICA
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ISSN | 0412-1961 |
卷号 | 44期号:10页码:1238-1242 |
摘要 | TiO2 photocatalytic thin films prepared by microarc oxidation (MAO) were modified by adding some oxides into electrolytes. The results show that the photocatalytic degradation ratio of the TiO2 film can be improved with the doped components of V, Ag and Ce, while the semiconductor doping may also obviously improve the photocatalytic activity of the film. As the doped concentrations of V2O5 and SnO2 are 0.5 and 1.0 mmol/L, respectively, the photocatalytic degradation ratio is significantly improved. XRD analysis results reveal that the above doping does not change the lattice type of TiO2. Doped films formed on Ti substate have high content of anatase, which would be ideal for the film with high photocatalytic properties. SEM images of the films indicate that the above doping makes the thickness and surface area of the film increase, and the microarc channel diameter of the film decrease. |
关键词 | LIGHT microarc oxidation TiO2 photocatalysis doping |
收录类别 | CSCD |
语种 | 英语 |
CSCD记录号 | CSCD:3420310 |
引用统计 | |
文献类型 | 期刊论文 |
条目标识符 | http://ir.imr.ac.cn/handle/321006/145117 |
专题 | 中国科学院金属研究所 |
作者单位 | 1.沈阳理工大学 2.中国科学院金属研究所 |
推荐引用方式 GB/T 7714 | Shao Zhongcai,Li Xiaodan,Su Huidong,et al. PHOTOCATALYTIC PROPERTIES OF TiO2 THIN FILMS PREPARED BY MICROARC OXIDATION AND DOPING ELECTROLYTES[J]. ACTA METALLURGICA SINICA,2008,44(10):1238-1242. |
APA | Shao Zhongcai,Li Xiaodan,Su Huidong,Wei Shouqiang,&Zhai Yuchun.(2008).PHOTOCATALYTIC PROPERTIES OF TiO2 THIN FILMS PREPARED BY MICROARC OXIDATION AND DOPING ELECTROLYTES.ACTA METALLURGICA SINICA,44(10),1238-1242. |
MLA | Shao Zhongcai,et al."PHOTOCATALYTIC PROPERTIES OF TiO2 THIN FILMS PREPARED BY MICROARC OXIDATION AND DOPING ELECTROLYTES".ACTA METALLURGICA SINICA 44.10(2008):1238-1242. |
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