| 沉积条件和表面改性对磁控溅射法制备TiO2薄膜性能的影响 | |
| Alternative Title | Growth Conditions and Properties of Magnetron Sputtered TiO2 Films |
| 张文杰; 杨丽丽; 李瑛; 朱圣龙; 王福会 | |
| 2007 | |
| Source Publication | 真空科学与技术学报
 |
| ISSN | 1672-7126 |
| Volume | 27.0Issue:006Pages:479-484 |
| Abstract | TiO2薄膜具有许多独特的性能，作为一种令人满意的材料被应用于诸多领域。磁控溅射作为制备这种多功能薄膜的一种主要方法，也越来越引起人们的关注。TiO2薄膜的结构和性能是由沉积条件决定的。通过改变沉积速度、溅射气体、靶温度、退火过程以及采用其它溅射技术，可以得到金红石、锐钛矿或是非晶的TiO2膜，同时具有不同的光催化、光学及电学性能，能够满足不同应用领域的需要。同时，表面改性可以克服TiO2薄膜的应用局限性，使之具有更佳的使用性能。 |
| Other Abstract | The latest progress in TiO2 films grown by magnetron sputtering or followed by sixrface modification,were tentatively reviewed with discussion focused on the influence of its growth conditions, such as deposition rate, type and pressure of the sputtering gas, target tempera- ture and voltage, and annealing, on its mierostruetures and properties. The phases of anatase, rutile and amorphous TiO2 films can be well controlled to meet the demands of different applications. Moreover, its limitations can possibly be removed with appropriate surface modifications to improve its favorable properties. |
| Keyword | 磁控溅射 TiO2 薄膜 沉积条件 表面改性 |
| Indexed By | CSCD |
| Language | 中文 |
| CSCD ID | CSCD:3042385 |
| Citation statistics |
Cited Times:4[CSCD]
[CSCD Record]
|
| Document Type | 期刊论文 |
| Identifier | http://ir.imr.ac.cn/handle/321006/146240 |
| Collection | 中国科学院金属研究所 |
| Affiliation | 中国科学院金属研究所 |
| Recommended Citation GB/T 7714 | 张文杰,杨丽丽,李瑛,等. 沉积条件和表面改性对磁控溅射法制备TiO2薄膜性能的影响[J]. 真空科学与技术学报,2007,27.0(006):479-484. |
| APA | 张文杰,杨丽丽,李瑛,朱圣龙,&王福会.(2007).沉积条件和表面改性对磁控溅射法制备TiO2薄膜性能的影响.真空科学与技术学报,27.0(006),479-484. |
| MLA | 张文杰,et al."沉积条件和表面改性对磁控溅射法制备TiO2薄膜性能的影响".真空科学与技术学报 27.0.006(2007):479-484. |
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