Silver-Assisted Chemical Etching of Semiconductor Materials

IMR OpenIR

	Silver-Assisted Chemical Etching of Semiconductor Materials
其他题名	Silver-Assisted Chemical Etching of Semiconductor Materials
	Geng Xuewen 1; He Chunlin 2; Xu Shichong 1; Li Jungang 1; Zhu Lijuan 2; Zhao Liancheng 1
	2012
发表期刊	PROGRESS IN CHEMISTRY
ISSN	1005-281X
卷号	24 期号:10 页码:1955-1965
摘要	Semiconductors with various structural morphologies are widely used in areas of electronics, optoelectronics, photovoltaics, sensors and thermoelectrics. The fabrication of solid-state micro/nanostructures has been motivated by the miniaturization and multi-functionality of microelectronic devices. Although some traditional methods can be used for texturization treatment of semiconductors, their applications are limited to some extent owing to their intrinsic disadvantages. Recently, the technologies of noble metal-assisted chemical etching (MacEtch) of semiconductors to produce micro/nanostructures have been paid much attention due to their relatively simple processes, fast reacting rate, low cost, and applicability for mass production etc. In this review, firstly, the MacEtch mechanisms, reaction phenomena and effect factors ( including the depositing methods, distribution, sizes, shape of Ag particles, and the composition of etchants) of Ag-assisted chemical etching of Si semiconductor are discussed in detail. And then the fabrication technologies of various microstructures such as porous Si, Si nanostructures, silicon nanowire arrays, and quasi-ordered micro/nanostructures are introduced to highlight the salient features of MacEtch of Si, and the state-of-the-art MacEtch of other semiconductors such as Ge, Si1-xGex, and GaAs is also summarized. Meantime, the potential applications of the MacEtch of semiconductors in different fields are overviewed. Finally, the current issues are analyzed and the outlook for the further research in this field is proposed.
关键词	SILICON SOLAR-CELLS CONCENTRATED HYDROGEN PEROXIDE AQUEOUS FLUORIDE SOLUTION MULTICRYSTALLINE SILICON POROUS SILICON NANOWIRE ARRAYS SI NANOWIRES CATALYTIC DECOMPOSITION ORDERED ARRAYS FABRICATION silver chemical etching semiconductors
收录类别	CSCD
语种	英语
CSCD记录号	CSCD:4645318
引用统计	被引频次：2[CSCD] [CSCD记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/146473
专题	中国科学院金属研究所
作者单位	1.Harbin Institute Technol, Sch Mat Sci & Engn, Harbin 150001, Peoples R China 2.中国科学院金属研究所
推荐引用方式 GB/T 7714	Geng Xuewen,He Chunlin,Xu Shichong,et al. Silver-Assisted Chemical Etching of Semiconductor Materials[J]. PROGRESS IN CHEMISTRY,2012,24(10):1955-1965.
APA	Geng Xuewen,He Chunlin,Xu Shichong,Li Jungang,Zhu Lijuan,&Zhao Liancheng.(2012).Silver-Assisted Chemical Etching of Semiconductor Materials.PROGRESS IN CHEMISTRY,24(10),1955-1965.
MLA	Geng Xuewen,et al."Silver-Assisted Chemical Etching of Semiconductor Materials".PROGRESS IN CHEMISTRY 24.10(2012):1955-1965.