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掺杂浓度对中频反应磁控溅射制备Al2O3:Ce^3+薄膜发光性能的影响
Alternative TitleEffect of Ce^3+ concentration on luminescent properties of Al2O3 : Ce^3+ films by medium frequency reactive magnetron sputtering
廖国进; 巴德纯; 闻立时; 刘斯明; 阎绍峰
2007
Source Publication功能材料与器件学报
ISSN1007-4252
Volume13.0Issue:006Pages:543-548
Abstract应用中频反应磁控溅射设备在载玻片上制备掺铈的Al2O3薄膜,在固定的电源功率下,氩气流量为23sccm,氧流量为5sccm,室温下溅射时间为90min的条件下,通过控制薄膜中的Ce^3+离子的掺杂量来改变薄膜的发光性能。通过X光能量散射谱(EDS)和光致发光测量,得到发光强度和发光峰位对薄膜中的Ce^3+浓度有强烈的依赖关系,并且分析了产生这种关系的原因;对发光激发谱分析表明,薄膜发光是源于薄膜中形成的氯化铈集合体中的Ce^3+。Al2O3:Ce^3+发光膜可应用于需要蓝光发射的平板显示领域.
Other AbstractAluminum oxide film doped with cerium was deposited by the medium frequency reactive magnetron sputtering technique, under the deposition condition of constant power, 30 minutes duration, Ar and 02 flow of 23 and 5 sccm, the relationship of luminescent properties of Al2O3 : Ce^3+ films with the amount of Ce^3+ incorporated in the films was studied. The presence of Ce^3+ and the stoichiometry of these films have been determined by energy dispersive x - ray spectroscope (EDS) measurements. It is observed that the total luminescence intensity increases and the peak sits strongly depends on the cerium concentration in the films. And served light emission generated the reason for the dependence was analyzed. It is proposed that the obby luminescent center is associated with cerium chloride molecular rather than atomic cerium impurities. The crystalline structure of the sample was analysed by x - ray diffractometry (XRD). This luminescence feature has an advantage in display techniques that require a purer blue emission.
Keyword三氧化二铝薄膜 中频反应磁控溅射 掺杂浓度 光致发光 Ce
Indexed ByCSCD
Language中文
CSCD IDCSCD:3039522
Citation statistics
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/146502
Collection中国科学院金属研究所
Affiliation中国科学院金属研究所
Recommended Citation
GB/T 7714
廖国进,巴德纯,闻立时,等. 掺杂浓度对中频反应磁控溅射制备Al2O3:Ce^3+薄膜发光性能的影响[J]. 功能材料与器件学报,2007,13.0(006):543-548.
APA 廖国进,巴德纯,闻立时,刘斯明,&阎绍峰.(2007).掺杂浓度对中频反应磁控溅射制备Al2O3:Ce^3+薄膜发光性能的影响.功能材料与器件学报,13.0(006),543-548.
MLA 廖国进,et al."掺杂浓度对中频反应磁控溅射制备Al2O3:Ce^3+薄膜发光性能的影响".功能材料与器件学报 13.0.006(2007):543-548.
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