| X-ray photoelectron spectroscopy analysis of the effect of thickness on the transformation temperature of NiTi alloy thin films | |
| Alternative Title | X-ray photoelectron spectroscopy analysis of the effect of thickness on the transformation temperature of NiTi alloy thin films |
| Li YongHua1; Meng FanLing1; Liu ChangSheng3; Zheng WeiTao2; Wang YuMing2 | |
| 2009 | |
| Source Publication | ACTA PHYSICA SINICA
 |
| ISSN | 1000-3290 |
| Volume | 58Issue:4Pages:2742-2745 |
| Abstract | The effect of thickness on transformation temperuture of the NiTi thin films has been studied by X-ray diffraction and X-ray photoelectron spectroscopy. Results show that the crystallization temperature for 3 mu m-thick film is higher than that for 18 mu m thick film at the same growth temperature and post annealing. With the substrate temperature increasing, the start temperature (A(s)) of austenite phase is lowered after annealing at 763 K for 1 h. There is an oxide layer (TiO2) on the film surface, which prevents the Ni atom from coming onto the surface. There is an oxide layer of a mixture Ti2O3 with NiO on the film /substrate interface. The oxide layers affect the transformation temperature by changing the Ni atomic content in the interior of the film. |
| Keyword | MARTENSITIC-TRANSFORMATION OXIDATION BEHAVIOR PHASE NiTi alloy film X-ray diffraction phase transformation X-ray photoelectron spectroscopy |
| Indexed By | CSCD |
| Language | 英语 |
| Funding Project | [Harbin Engineering University, China] ; [National Science Foundation for Post-doctoral Scientists of China] ; [Post-doctoral Sustentation Fund of Heilongjiang Province, China] |
| CSCD ID | CSCD:3540652 |
| Citation statistics |
Cited Times:1[CSCD]
[CSCD Record]
|
| Document Type | 期刊论文 |
| Identifier | http://ir.imr.ac.cn/handle/321006/147237 |
| Collection | 中国科学院金属研究所 |
| Affiliation | 1.Harbin Engn University, Sch Sci, Natl Key Lab Technol AUVs, Harbin 150001, Peoples R China 2.中山大学 3.中国科学院金属研究所 |
| Recommended Citation GB/T 7714 | Li YongHua,Meng FanLing,Liu ChangSheng,et al. X-ray photoelectron spectroscopy analysis of the effect of thickness on the transformation temperature of NiTi alloy thin films[J]. ACTA PHYSICA SINICA,2009,58(4):2742-2745. |
| APA | Li YongHua,Meng FanLing,Liu ChangSheng,Zheng WeiTao,&Wang YuMing.(2009).X-ray photoelectron spectroscopy analysis of the effect of thickness on the transformation temperature of NiTi alloy thin films.ACTA PHYSICA SINICA,58(4),2742-2745. |
| MLA | Li YongHua,et al."X-ray photoelectron spectroscopy analysis of the effect of thickness on the transformation temperature of NiTi alloy thin films".ACTA PHYSICA SINICA 58.4(2009):2742-2745. |
| Files in This Item: | There are no files associated with this item. | |||||
Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.
Edit Comment