IMR OpenIR
负偏压在电弧离子镀沉积TiN/TiCN多层薄膜中的作用
黄美东; 林国强; 董闯; 孙超; 蒋长荣; 黄荣芳; 闻立时
2001
Source Publication金属热处理
ISSN0254-6051
Volume26.0Issue:007Pages:17-20
Abstract用电弧离子镀方法在高速钢、不锈钢与铜基体上沉积合成Ti/TiCN多层薄膜,在其他参数不变的情况下只改变负偏压,着重考察不同负偏压下薄膜的沉积深度、膜基结合强度、显微硬度以及表面形貌等,研究基体负偏压在沉积多层薄膜中所起的作用。结果表明,负偏压影响沉积温度,负偏压值越大,温度越高;负偏压值增大,表面形貌中的大颗粒数量减少,薄膜质量得到改善;负偏压在-300V左右时,膜基结合强度与硬度出现对应最佳性能点的峰值。
Keyword电弧离子镀 负偏压 多层薄膜 氮化钛 碳氮化钛
Indexed ByCSCD
Language中文
CSCD IDCSCD:674485
Citation statistics
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/147869
Collection中国科学院金属研究所
Affiliation中国科学院金属研究所
Recommended Citation
GB/T 7714
黄美东,林国强,董闯,等. 负偏压在电弧离子镀沉积TiN/TiCN多层薄膜中的作用[J]. 金属热处理,2001,26.0(007):17-20.
APA 黄美东.,林国强.,董闯.,孙超.,蒋长荣.,...&闻立时.(2001).负偏压在电弧离子镀沉积TiN/TiCN多层薄膜中的作用.金属热处理,26.0(007),17-20.
MLA 黄美东,et al."负偏压在电弧离子镀沉积TiN/TiCN多层薄膜中的作用".金属热处理 26.0.007(2001):17-20.
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