| 混合靶磁控反应溅射制备铁掺杂TiO2光催化剂薄膜 | |
| Alternative Title | Growth of Fe-Doped TiO2 Photo-Catalyst Films by Reactive Magnetron Co-Sputtering |
| 张文杰; 李汝愿; 李瑛; 朱圣龙; 王福会 | |
| 2010 | |
| Source Publication | 真空科学与技术学报
 |
| ISSN | 1672-7126 |
| Volume | 30.0Issue:003Pages:288-292 |
| Abstract | 采用直流磁控反应混合靶共溅射的方法，在玻璃基体上制备出了Fe掺杂的TiO2膜，优化了沉积条件以制备出均匀透明的TiO2膜。通过调整固定在Ti靶上的Fe片面积可以控制膜中Fe的浓度。随着Fe浓度的增加，膜的表面形貌从平整变得粗糙。Fe含量低的膜为锐钛矿晶体结构，在Fe含量高的膜中出现了Fe的氧化物。在纯TiO2膜中钛以Ti4＋的形式存在，而在含Fe的膜中钛的氧化态下降，出现了混合价态。Fe的存在导致膜的光谱吸收边沿向可见光谱方向移动。Fe掺杂浓度低的膜比纯TiO2膜表现出了更强的光催化活性。另一方面，过多n的掺杂导致TiO2膜的光催化活性快速下降。 |
| Other Abstract | The Fe-doped, TiO2 photo-catalyst films were deposited by reactive magnetron co-sputtering of a Ti target attached with a small slab of iron on glass substrates. The impacts of deposition conditions, including dosage of iron, sput- tering power, and oxygen level on the film growth were studied. The microstructures and photo-catalyst activity were char- acterized with X-ray diffraction, X-ray photoelectron spectroscopy, scanning electron microscopy and ultraviolet visible spectroscopy. The results show that the Fe impurity content significantly affects the microstructures and photo-catalyst ac- tivity of the films. For instance, Fe-doping roughness the film surfaces. The phase of lightly doped film was found to be anatase, whereas the iron oxide phase was observed in the heavily doped films. Fe-doping results in a transition from Ti4 ＋ in pure TiO2 films to the mixed oxidation states of Ti. The absorption edge shifts toward the visible region with increasing Fe impurity content. Though light Fe-doping improves the photo-catalyst activity of TiO2 films, heavy Fe-doping drastically reduces the photo-catalytic degradation rates of methyl orange. |
| Keyword | TiO2 光催化 磁控溅射 Fe掺杂 |
| Indexed By | CSCD |
| Language | 中文 |
| CSCD ID | CSCD:3937569 |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.imr.ac.cn/handle/321006/152938 |
| Collection | 中国科学院金属研究所 |
| Affiliation | 中国科学院金属研究所 |
| Recommended Citation GB/T 7714 | 张文杰,李汝愿,李瑛,等. 混合靶磁控反应溅射制备铁掺杂TiO2光催化剂薄膜[J]. 真空科学与技术学报,2010,30.0(003):288-292. |
| APA | 张文杰,李汝愿,李瑛,朱圣龙,&王福会.(2010).混合靶磁控反应溅射制备铁掺杂TiO2光催化剂薄膜.真空科学与技术学报,30.0(003),288-292. |
| MLA | 张文杰,et al."混合靶磁控反应溅射制备铁掺杂TiO2光催化剂薄膜".真空科学与技术学报 30.0.003(2010):288-292. |
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