Alternative TitleGrowth of Fe-Doped TiO2 Photo-Catalyst Films by Reactive Magnetron Co-Sputtering
张文杰; 李汝愿; 李瑛; 朱圣龙; 王福会
Source Publication真空科学与技术学报
Other AbstractThe Fe-doped, TiO2 photo-catalyst films were deposited by reactive magnetron co-sputtering of a Ti target attached with a small slab of iron on glass substrates. The impacts of deposition conditions, including dosage of iron, sput- tering power, and oxygen level on the film growth were studied. The microstructures and photo-catalyst activity were char- acterized with X-ray diffraction, X-ray photoelectron spectroscopy, scanning electron microscopy and ultraviolet visible spectroscopy. The results show that the Fe impurity content significantly affects the microstructures and photo-catalyst ac- tivity of the films. For instance, Fe-doping roughness the film surfaces. The phase of lightly doped film was found to be anatase, whereas the iron oxide phase was observed in the heavily doped films. Fe-doping results in a transition from Ti4 + in pure TiO2 films to the mixed oxidation states of Ti. The absorption edge shifts toward the visible region with increasing Fe impurity content. Though light Fe-doping improves the photo-catalyst activity of TiO2 films, heavy Fe-doping drastically reduces the photo-catalytic degradation rates of methyl orange.
KeywordTiO2 光催化 磁控溅射 Fe掺杂
Indexed ByCSCD
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Document Type期刊论文
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GB/T 7714
张文杰,李汝愿,李瑛,等. 混合靶磁控反应溅射制备铁掺杂TiO2光催化剂薄膜[J]. 真空科学与技术学报,2010,30.0(003):288-292.
APA 张文杰,李汝愿,李瑛,朱圣龙,&王福会.(2010).混合靶磁控反应溅射制备铁掺杂TiO2光催化剂薄膜.真空科学与技术学报,30.0(003),288-292.
MLA 张文杰,et al."混合靶磁控反应溅射制备铁掺杂TiO2光催化剂薄膜".真空科学与技术学报 30.0.003(2010):288-292.
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