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Si3N4/SiC纳米复相陶瓷研究进展
陈远志; 梁勇
1999
Source Publication中国陶瓷
ISSN1001-9642
Volume35.0Issue:002Pages:34-36
Abstract本文综述了Si3N4/SiC纳米复相陶瓷的研究进展,较详细地介绍了纳米粉体的制备工艺及热处理研究、复相陶瓷的制备工艺、力学性能、微观结构及增韧强化机理。
Keyword纳米粉体 氮化硅 复合陶瓷 碳化硅
Indexed ByCSCD
Language中文
CSCD IDCSCD:851611
Citation statistics
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/153322
Collection中国科学院金属研究所
Affiliation中国科学院金属研究所
Recommended Citation
GB/T 7714
陈远志,梁勇. Si3N4/SiC纳米复相陶瓷研究进展[J]. 中国陶瓷,1999,35.0(002):34-36.
APA 陈远志,&梁勇.(1999).Si3N4/SiC纳米复相陶瓷研究进展.中国陶瓷,35.0(002),34-36.
MLA 陈远志,et al."Si3N4/SiC纳米复相陶瓷研究进展".中国陶瓷 35.0.002(1999):34-36.
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