| The accelerating nanoscale Kirkendall effect in Co films–native oxide Si(100)system induced by high magnetic fields | |
| Alternative Title | The accelerating nanoscale Kirkendall effect in Co films–native oxide Si (100) system induced by high magnetic fields |
| Yue Zhao1; Kai Wang2; Shuang Yuan3; Yonghui Ma4; Guojian Li2; Qiang Wang2 | |
| 2020 | |
| Source Publication | 材料科学技术:英文版
 |
| ISSN | 1005-0302 |
| Volume | 42.0Issue:011Pages:127-135 |
| Abstract | The morphology evolution and magnetic properties of Co films–native oxide Si(100)were investigated at 873,973,and 1073 K in a high magnetic field of 11.5 T.Formation of Kirkendall voids in the Co films was found to cause morphology evolution due to the difference in diffusion flux of Co and Si atoms through the native oxide layer.The high magnetic fields had considerable effect on the morphology evolution by accelerating nanoscale Kirkendall effect.The diffusion mechanism in the presence of high magnetic fields was given to explain the increase of diffusion coefficient.The morphology evolution of Co films on native oxide Si(100)under high magnetic fields during annealing resulted in the magnetic properties variation. |
| Keyword | Thin films Annealing Diffusion Kirkendall effect High magnetic field |
| Indexed By | CSCD |
| Language | 中文 |
| Funding Project | [National Natural Science Foundation of China] ; [Liaoning Innovative Research Team in University] ; [Fundamental Research Funds for the Central Universities] |
| CSCD ID | CSCD:6758255 |
| Citation statistics |
Cited Times:2[CSCD]
[CSCD Record]
|
| Document Type | 期刊论文 |
| Identifier | http://ir.imr.ac.cn/handle/321006/157251 |
| Collection | 中国科学院金属研究所 |
| Affiliation | 1.Institute of Microscale Optoelectronics,Shenzhen University 2.Key Laboratory of Electromagnetic Processing of Materials(Ministry of Education 3.Department of New Energy Science and Engineering,School of Metallurgy,Northeastern University 4.中国科学院金属研究所 |
| Recommended Citation GB/T 7714 | Yue Zhao,Kai Wang,Shuang Yuan,等. The accelerating nanoscale Kirkendall effect in Co films–native oxide Si(100)system induced by high magnetic fields[J]. 材料科学技术:英文版,2020,42.0(011):127-135. |
| APA | Yue Zhao,Kai Wang,Shuang Yuan,Yonghui Ma,Guojian Li,&Qiang Wang.(2020).The accelerating nanoscale Kirkendall effect in Co films–native oxide Si(100)system induced by high magnetic fields.材料科学技术:英文版,42.0(011),127-135. |
| MLA | Yue Zhao,et al."The accelerating nanoscale Kirkendall effect in Co films–native oxide Si(100)system induced by high magnetic fields".材料科学技术:英文版 42.0.011(2020):127-135. |
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