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High vacuum arc ion plating Cr films: Self-ion bombarding effect and oxidation behavior
Wu, Jiaojiao1,2; Shen, Mingli2; Hu, Ming3; Guo, Cean3; Li, Qiang4; Zhu, Shenglong2
通讯作者Shen, Mingli(mlshen@imr.ac.cn) ; Hu, Ming(310119126@qq.com)
2021-07-15
发表期刊CORROSION SCIENCE
ISSN0010-938X
卷号187页码:12
摘要High vacuum arc ion plating gas-free Cr films under self-ion bombarding and their oxidation behaviours were investigated. Ultrafine column-grained Cr films were obtained, which showed stronger crystallographic orientation of (200) as the bombarding energy increased from 50 eV to 250 eV. Oxidation of the Cr films at 900 degrees C revealed that the thickness of the chromia scale decreased with enhanced bombarding energy. The thickness decreases over 56 % due to the elimination of gas inclusion but only around 18 % further by introducing orientation in the film, demonstrating the key role of high vacuum for depositing advanced Cr films.
关键词Cr films Arc ion plating TEM Oxidation Inclusion
资助者Youth Innovation Promotion Association of Chinese Academy of Sciences ; National Key R&D Program of China
DOI10.1016/j.corsci.2021.109476
收录类别SCI
语种英语
资助项目Youth Innovation Promotion Association of Chinese Academy of Sciences[2018224] ; National Key R&D Program of China[2018YFB2003601]
WOS研究方向Materials Science ; Metallurgy & Metallurgical Engineering
WOS类目Materials Science, Multidisciplinary ; Metallurgy & Metallurgical Engineering
WOS记录号WOS:000657394300001
出版者PERGAMON-ELSEVIER SCIENCE LTD
引用统计
被引频次:23[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.imr.ac.cn/handle/321006/160316
专题中国科学院金属研究所
通讯作者Shen, Mingli; Hu, Ming
作者单位1.Univ Sci & Technol China, Sch Mat Sci & Engn, 72 Wenhua Rd, Shenyang 110016, Peoples R China
2.Chinese Acad Sci, Inst Met Res, Shi Changxu Innovat Ctr Adv Mat, 62 Wencui Rd, Shenyang 110016, Peoples R China
3.Shenyang Ligong Univ, Sch Equipment Engn, 6 Nanpingzhong Rd, Shenyang 110159, Peoples R China
4.North Univ China, Sch Mech Engn, 3 Xueyuan Rd, Taiyuan 030051, Peoples R China
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GB/T 7714
Wu, Jiaojiao,Shen, Mingli,Hu, Ming,et al. High vacuum arc ion plating Cr films: Self-ion bombarding effect and oxidation behavior[J]. CORROSION SCIENCE,2021,187:12.
APA Wu, Jiaojiao,Shen, Mingli,Hu, Ming,Guo, Cean,Li, Qiang,&Zhu, Shenglong.(2021).High vacuum arc ion plating Cr films: Self-ion bombarding effect and oxidation behavior.CORROSION SCIENCE,187,12.
MLA Wu, Jiaojiao,et al."High vacuum arc ion plating Cr films: Self-ion bombarding effect and oxidation behavior".CORROSION SCIENCE 187(2021):12.
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