IMR OpenIR
Development of hydrogen-free fully amorphous silicon oxycarbide coating by thermal organometallic chemical vapor deposition technique
Liu, Housheng1,2; Tariq, Naeem ul Haq3; Han, Rifei1,2; Liu, Hanhui1,2; Cui, Xinyu1; Tang, Mingqiang1; Xiong, Tianying1
Corresponding AuthorTang, Mingqiang(mqtang@imr.ac.cn) ; Xiong, Tianying(tyxiong@imr.ac.cn)
2022
Source PublicationJOURNAL OF NON-CRYSTALLINE SOLIDS
ISSN0022-3093
Volume575Pages:8
AbstractIn this study, a dense fully amorphous (hydrogen-free) silicon oxycarbide (SiOC) coating was successfully deposited by thermal organometallic chemical vapor deposition (thermal MOCVD) technique using mixtures of liquid hexamethyldisiloxane (HMDSO) and ethanol. The nature of chemical bonding, microstructure and mechanical properties of the prepared coating were studied using field emission scanning electron microscopy (FESEM), scanning transmission electron microscopy (STEM), 29Si magic-angle-spinning nuclear magnetic resonance (MAS NMR), X-ray photoelectron spectroscopy (XPS), Raman spectroscopy and nano indentation techniques. The results showed that the prepared silicon oxycarbide coating is fully amorphous and it is composed of SiO4 and SiO3C structural units. The hardness (11.0 GPa) and elastic modulus (96.0 GPa) of the prepared coating were comparable or even better than other SiOC ceramic materials prepared by traditional high temperature processing techniques.
KeywordChemical vapor deposition Amorphous SiOC coating Amorphous carbon
DOI10.1016/j.jnoncrysol.2021.121204
Indexed BySCI
Language英语
WOS Research AreaMaterials Science
WOS SubjectMaterials Science, Ceramics ; Materials Science, Multidisciplinary
WOS IDWOS:000709825200007
PublisherELSEVIER
Citation statistics
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/167101
Collection中国科学院金属研究所
Corresponding AuthorTang, Mingqiang; Xiong, Tianying
Affiliation1.Chinese Acad Sci, Shi Changxu Innovat Ctr Adv Mat, Inst Met Res, Shenyang 110016, Peoples R China
2.Univ Sci & Technol China, Sch Mat Sci & Engn, Shenyang 110016, Peoples R China
3.Pakistan Inst Engn & Appl Sci, Dept Met & Mat Engn, Islamabad, Pakistan
Recommended Citation
GB/T 7714
Liu, Housheng,Tariq, Naeem ul Haq,Han, Rifei,et al. Development of hydrogen-free fully amorphous silicon oxycarbide coating by thermal organometallic chemical vapor deposition technique[J]. JOURNAL OF NON-CRYSTALLINE SOLIDS,2022,575:8.
APA Liu, Housheng.,Tariq, Naeem ul Haq.,Han, Rifei.,Liu, Hanhui.,Cui, Xinyu.,...&Xiong, Tianying.(2022).Development of hydrogen-free fully amorphous silicon oxycarbide coating by thermal organometallic chemical vapor deposition technique.JOURNAL OF NON-CRYSTALLINE SOLIDS,575,8.
MLA Liu, Housheng,et al."Development of hydrogen-free fully amorphous silicon oxycarbide coating by thermal organometallic chemical vapor deposition technique".JOURNAL OF NON-CRYSTALLINE SOLIDS 575(2022):8.
Files in This Item:
There are no files associated with this item.
Related Services
Recommend this item
Bookmark
Usage statistics
Export to Endnote
Google Scholar
Similar articles in Google Scholar
[Liu, Housheng]'s Articles
[Tariq, Naeem ul Haq]'s Articles
[Han, Rifei]'s Articles
Baidu academic
Similar articles in Baidu academic
[Liu, Housheng]'s Articles
[Tariq, Naeem ul Haq]'s Articles
[Han, Rifei]'s Articles
Bing Scholar
Similar articles in Bing Scholar
[Liu, Housheng]'s Articles
[Tariq, Naeem ul Haq]'s Articles
[Han, Rifei]'s Articles
Terms of Use
No data!
Social Bookmark/Share
All comments (0)
No comment.
 

Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.