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Effect of modulation period on structure and mechanical properties of WB2/a-WBC films deposited by direct-current magnetron sputtering
Liu, Yanming1; Zhao, Xingxing1; Tian, Li1; Wang, Chen1; Pei, Zhiliang2
Corresponding AuthorLiu, Yanming(ymliu10s@alum.imr.ac.cn) ; Pei, Zhiliang(zlpei@imr.ac.cn)
2021-12-01
Source PublicationTHIN SOLID FILMS
ISSN0040-6090
Volume739Pages:9
AbstractWB2/a-WBC multilayer films with different modulation periods ranging from 145 to 830 nm were synthesized by direct-current magnetron sputtering. The effect of modulation period (Lambda) on structure and tribo-mechanical properties of the WB2/a-WBC multilayer films was studied. The WB2 monolayer grows preferentially along (101) plane. However, the multilayered structure changes the growth of WB2 sublayers to (001) plane, and a transition layer with composition gradient distribution is formed at the interface between the two sublayers. Consequently, WB2, WB2(C) solid solution and a-WC are detected in the WB2 sublayer, while a-WBC, a-WC and a C are found in the WBC sublayer. As the modulation period decreases, the residual compressive stress (-384 similar to 827 MPa) of the WB2/a-WBC films increases first and then decreases, and the hardness of the WB2/a-WBC films (18.8 similar to 23.7 GPa) gradually increases under the joint action of solid solution strengthening and interface strengthening. Moreover, the fracture toughness of the WB2/a-WBC films is also improved greatly resulting from the multilayered structure with the soft a-WBC sublayers. The wear mechanism of the WB2/a-WBC films is a mixture of abrasion and lubrication, and the friction coefficient and wear rate of the WB2/a-WBC films are lower than those of the WB2 and WBC monolayer films because of their excellent toughness and lubricating effect as well as moderate hardness. Comprehensively, the WB2/a-WBC films with Lambda=830 and 415 nm display lower friction coefficient (similar to 0.08) and wear rate (1.14 similar to 1.24 x 10(-7) mm(3)/mN).
KeywordMagnetron sputtering Tungsten boride Amorphous tungsten borocarbide Multilayer films Modulation period Tribo-mechanical properties
Funding OrganizationNatural Science Foundation of China ; Graduate Student Innova-tion and Practical Ability Training Program of Xi'an Shiyou University ; Science and Technology Nova Project-Innovative Talent Promotion Program of Shaanxi Prov-ince, China ; Innovation Team Funding by Xi'an Shiyou University
DOI10.1016/j.tsf.2021.138994
Indexed BySCI
Language英语
Funding ProjectNatural Science Foundation of China[51701157] ; Natural Science Foundation of China[51902254] ; Natural Science Foundation of China[52071274] ; Graduate Student Innova-tion and Practical Ability Training Program of Xi'an Shiyou University[YCS20211041] ; Science and Technology Nova Project-Innovative Talent Promotion Program of Shaanxi Prov-ince, China[2020KJXX-062] ; Innovation Team Funding by Xi'an Shiyou University[2019QNKYCXTD12]
WOS Research AreaMaterials Science ; Physics
WOS SubjectMaterials Science, Multidisciplinary ; Materials Science, Coatings & Films ; Physics, Applied ; Physics, Condensed Matter
WOS IDWOS:000730121800005
PublisherELSEVIER SCIENCE SA
Citation statistics
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/167296
Collection中国科学院金属研究所
Corresponding AuthorLiu, Yanming; Pei, Zhiliang
Affiliation1.Xian Shiyou Univ, Coll Mat Sci & Engn, Xian 710065, Peoples R China
2.Chinese Acad Sci, Inst Met Res, Shenyang 110016, Peoples R China
Recommended Citation
GB/T 7714
Liu, Yanming,Zhao, Xingxing,Tian, Li,et al. Effect of modulation period on structure and mechanical properties of WB2/a-WBC films deposited by direct-current magnetron sputtering[J]. THIN SOLID FILMS,2021,739:9.
APA Liu, Yanming,Zhao, Xingxing,Tian, Li,Wang, Chen,&Pei, Zhiliang.(2021).Effect of modulation period on structure and mechanical properties of WB2/a-WBC films deposited by direct-current magnetron sputtering.THIN SOLID FILMS,739,9.
MLA Liu, Yanming,et al."Effect of modulation period on structure and mechanical properties of WB2/a-WBC films deposited by direct-current magnetron sputtering".THIN SOLID FILMS 739(2021):9.
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