Nanometer materials have been aroused extensive interest because of their unique properties, such as surface effect, volume effect and nanosize effect of constitutive characteristics. As an important kind of nanometer materials, thin metal films showed some novel properties which differ with bulk materials, thus it was widely used in a variety of applications.
In this thesis, aluminum films were deposited by magnetron sputtering method. By analyzing the surface morphology of film with different thickness, the influence of conductivity and permittivity on deposition parameter was explored; By studying the possible microwave response mode of metallic films, the dependence of microwave response properties on constructive parameters was built, which can help to improve the ability to engineer electromagnetic properties of thin metallic films for practical application.
The experimental results of intrinsic parameters and microwave absorption data were listed as follows: four point probe measurement result indicate that the dc conductivity of aluminum film increased correspondingly with the increase of film thickness. And with the consideration of surface roughness, and grain boundary scattering’s contribution, the calculated result was well matched with the experimental data. For metal-dielectric layered structure, the single aluminum film can absorb large amount of electromagnetic wave power, even as large as 50%, and the absorption rate varied with films’ conductivity and thickness. Besides, the total absorption will also be varied with permittivity and polarization mode of electromagnetic wave.
Beside, the absorption properties of metal-dielectric layer structure was simulated by finite element software Ansoft’s HFSSTM, and the effective electromagnetic parameter testing code which based on scattering parameter retrieval method was developed to get the effective permittivity and permeability.
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