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Patterning of Wafer-Scale MXene Films for High-Performance Image Sensor Arrays
Li, Bo1,2; Zhu, Qian-Bing1,2; Cui, Cong1,2; Liu, Chi1,2; Wang, Zuo-Hua3; Feng, Shun1,4; Sun, Yun1; Zhu, Hong-Lei1,2; Su, Xin5; Zhao, Yi-Ming1,2; Zhang, Hong-Wang3; Yao, Jian6; Qiu, Song6; Li, Qing-Wen6; Wang, Xiao-Mu5; Wang, Xiao-Hui1,2; Cheng, Hui-Ming1,2,7; Sun, Dong-Ming1,2
Corresponding AuthorLiu, Chi(chiliu@imr.ac.cn) ; Wang, Xiao-Mu(xiaomu.wang@nju.edu.cn) ; Wang, Xiao-Hui(wang@imr.ac.cn) ; Sun, Dong-Ming(dmsun@imr.ac.cn)
2022-03-20
Source PublicationADVANCED MATERIALS
ISSN0935-9648
Pages8
AbstractAs a rapidly growing family of 2D transition metal carbides and nitrides, MXenes are recognized as promising materials for the development of future electronics and optoelectronics. So far, the reported patterning methods for MXene films lack efficiency, resolution, and compatibility, resulting in limited device integration and performance. Here, a high-performance MXene image sensor array fabricated by a wafer-scale combination patterning method of an MXene film is reported. This method combines MXene centrifugation, spin-coating, photolithography, and dry-etching and is highly compatible with mainstream semiconductor processing, with a resolution up to 2 mu m, which is at least 100 times higher than other large-area patterning methods reported previously. As a result, a high-density integrated array of 1024-pixel Ti3C2Tx/Si photodetectors with a detectivity of 7.73 x 10(14) Jones and a light-dark current ratio (I-light/I-dark) of 6.22 x 10(6), which is the ultrahigh value among all reported MXene-based photodetectors, is fabricated. This patterning technique paves a way for large-scale high-performance MXetronics compatible with mainstream semiconductor processes.
Keywordimage sensor arrays MXenes MXene photodetectors wafer-scale patterning technology
Funding OrganizationStrategic Priority Research Program of Chinese Academy of Sciences ; Key Research Program of Frontier Sciences of the Chinese Academy of Sciences ; Liaoning Revitalization Talents Program ; Shandong Natural Science Foundation of China ; National Natural Science Foundation of China ; Chinese Academy of Sciences
DOI10.1002/adma.202201298
Indexed BySCI
Language英语
Funding ProjectStrategic Priority Research Program of Chinese Academy of Sciences[XDB30000000] ; Key Research Program of Frontier Sciences of the Chinese Academy of Sciences[ZDBSLY-JSC027] ; Liaoning Revitalization Talents Program[XLYC1807109] ; Shandong Natural Science Foundation of China[ZR2019ZD49] ; National Natural Science Foundation of China[62074150] ; National Natural Science Foundation of China[61704175] ; Chinese Academy of Sciences[SKLA-2019-03]
WOS Research AreaChemistry ; Science & Technology - Other Topics ; Materials Science ; Physics
WOS SubjectChemistry, Multidisciplinary ; Chemistry, Physical ; Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Physics, Applied ; Physics, Condensed Matter
WOS IDWOS:000770788700001
PublisherWILEY-V C H VERLAG GMBH
Citation statistics
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/173117
Collection中国科学院金属研究所
Corresponding AuthorLiu, Chi; Wang, Xiao-Mu; Wang, Xiao-Hui; Sun, Dong-Ming
Affiliation1.Chinese Acad Sci, Inst Met Res, Shenyang Natl Lab Mat Sci, 72 Wenhua Rd, Shenyang 110016, Peoples R China
2.Univ Sci & Technol China, Sch Mat Sci & Engn, 96 Jinzhai Rd, Hefei 230026, Peoples R China
3.Yanshan Univ, Coll Mech Engn, Natl Engn Res Ctr Equipment & Technol Cold Strip, Qinhuangdao 066004, Hebei, Peoples R China
4.ShanghaiTech Univ, Sch Phys Sci & Technol, 393 Huaxiazhong Rd, Shanghai 200031, Peoples R China
5.Nanjing Univ, Collaborat Innovat Ctr Adv Microstruct, Sch Elect Sci & Engn, Sch Phys,Natl Lab Solid State Microstruct, Nanjing 210008, Peoples R China
6.Chinese Acad Sci, Suzhou Inst Nanotech & Nanobion, 398 Ruoshui Rd, Suzhou 215123, Peoples R China
7.Chinese Acad Sci, Shenzhen Inst Adv Technol, Inst Technol Carbon Neutral, 1068 Xueyuan Ave, Shenzhen 518055, Peoples R China
Recommended Citation
GB/T 7714
Li, Bo,Zhu, Qian-Bing,Cui, Cong,et al. Patterning of Wafer-Scale MXene Films for High-Performance Image Sensor Arrays[J]. ADVANCED MATERIALS,2022:8.
APA Li, Bo.,Zhu, Qian-Bing.,Cui, Cong.,Liu, Chi.,Wang, Zuo-Hua.,...&Sun, Dong-Ming.(2022).Patterning of Wafer-Scale MXene Films for High-Performance Image Sensor Arrays.ADVANCED MATERIALS,8.
MLA Li, Bo,et al."Patterning of Wafer-Scale MXene Films for High-Performance Image Sensor Arrays".ADVANCED MATERIALS (2022):8.
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