| Patterning of Wafer-Scale MXene Films for High-Performance Image Sensor Arrays | |
| Li, Bo1,2; Zhu, Qian-Bing1,2; Cui, Cong1,2; Liu, Chi1,2; Wang, Zuo-Hua3; Feng, Shun1,4; Sun, Yun1; Zhu, Hong-Lei1,2; Su, Xin5; Zhao, Yi-Ming1,2; Zhang, Hong-Wang3; Yao, Jian6; Qiu, Song6; Li, Qing-Wen6; Wang, Xiao-Mu5; Wang, Xiao-Hui1,2; Cheng, Hui-Ming1,2,7; Sun, Dong-Ming1,2 | |
| 通讯作者 | Liu, Chi(chiliu@imr.ac.cn) ; Wang, Xiao-Mu(xiaomu.wang@nju.edu.cn) ; Wang, Xiao-Hui(wang@imr.ac.cn) ; Sun, Dong-Ming(dmsun@imr.ac.cn) |
| 2022-03-20 | |
| 发表期刊 | ADVANCED MATERIALS
 |
| ISSN | 0935-9648 |
| 页码 | 8 |
| 摘要 | As a rapidly growing family of 2D transition metal carbides and nitrides, MXenes are recognized as promising materials for the development of future electronics and optoelectronics. So far, the reported patterning methods for MXene films lack efficiency, resolution, and compatibility, resulting in limited device integration and performance. Here, a high-performance MXene image sensor array fabricated by a wafer-scale combination patterning method of an MXene film is reported. This method combines MXene centrifugation, spin-coating, photolithography, and dry-etching and is highly compatible with mainstream semiconductor processing, with a resolution up to 2 mu m, which is at least 100 times higher than other large-area patterning methods reported previously. As a result, a high-density integrated array of 1024-pixel Ti3C2Tx/Si photodetectors with a detectivity of 7.73 x 10(14) Jones and a light-dark current ratio (I-light/I-dark) of 6.22 x 10(6), which is the ultrahigh value among all reported MXene-based photodetectors, is fabricated. This patterning technique paves a way for large-scale high-performance MXetronics compatible with mainstream semiconductor processes. |
| 关键词 | image sensor arrays MXenes MXene photodetectors wafer-scale patterning technology |
| 资助者 | Strategic Priority Research Program of Chinese Academy of Sciences ; Key Research Program of Frontier Sciences of the Chinese Academy of Sciences ; Liaoning Revitalization Talents Program ; Shandong Natural Science Foundation of China ; National Natural Science Foundation of China ; Chinese Academy of Sciences |
| DOI | 10.1002/adma.202201298 |
| 收录类别 | SCI |
| 语种 | 英语 |
| 资助项目 | Strategic Priority Research Program of Chinese Academy of Sciences[XDB30000000] ; Key Research Program of Frontier Sciences of the Chinese Academy of Sciences[ZDBSLY-JSC027] ; Liaoning Revitalization Talents Program[XLYC1807109] ; Shandong Natural Science Foundation of China[ZR2019ZD49] ; National Natural Science Foundation of China[62074150] ; National Natural Science Foundation of China[61704175] ; Chinese Academy of Sciences[SKLA-2019-03] |
| WOS研究方向 | Chemistry ; Science & Technology - Other Topics ; Materials Science ; Physics |
| WOS类目 | Chemistry, Multidisciplinary ; Chemistry, Physical ; Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Physics, Applied ; Physics, Condensed Matter |
| WOS记录号 | WOS:000770788700001 |
| 出版者 | WILEY-V C H VERLAG GMBH |
| 引用统计 | |
| 文献类型 | 期刊论文 |
| 条目标识符 | http://ir.imr.ac.cn/handle/321006/173117 |
| 专题 | 中国科学院金属研究所 |
| 通讯作者 | Liu, Chi; Wang, Xiao-Mu; Wang, Xiao-Hui; Sun, Dong-Ming |
| 作者单位 | 1.Chinese Acad Sci, Inst Met Res, Shenyang Natl Lab Mat Sci, 72 Wenhua Rd, Shenyang 110016, Peoples R China 2.Univ Sci & Technol China, Sch Mat Sci & Engn, 96 Jinzhai Rd, Hefei 230026, Peoples R China 3.Yanshan Univ, Coll Mech Engn, Natl Engn Res Ctr Equipment & Technol Cold Strip, Qinhuangdao 066004, Hebei, Peoples R China 4.ShanghaiTech Univ, Sch Phys Sci & Technol, 393 Huaxiazhong Rd, Shanghai 200031, Peoples R China 5.Nanjing Univ, Collaborat Innovat Ctr Adv Microstruct, Sch Elect Sci & Engn, Sch Phys,Natl Lab Solid State Microstruct, Nanjing 210008, Peoples R China 6.Chinese Acad Sci, Suzhou Inst Nanotech & Nanobion, 398 Ruoshui Rd, Suzhou 215123, Peoples R China 7.Chinese Acad Sci, Shenzhen Inst Adv Technol, Inst Technol Carbon Neutral, 1068 Xueyuan Ave, Shenzhen 518055, Peoples R China |
| 推荐引用方式 GB/T 7714 | Li, Bo,Zhu, Qian-Bing,Cui, Cong,et al. Patterning of Wafer-Scale MXene Films for High-Performance Image Sensor Arrays[J]. ADVANCED MATERIALS,2022:8. |
| APA | Li, Bo.,Zhu, Qian-Bing.,Cui, Cong.,Liu, Chi.,Wang, Zuo-Hua.,...&Sun, Dong-Ming.(2022).Patterning of Wafer-Scale MXene Films for High-Performance Image Sensor Arrays.ADVANCED MATERIALS,8. |
| MLA | Li, Bo,et al."Patterning of Wafer-Scale MXene Films for High-Performance Image Sensor Arrays".ADVANCED MATERIALS (2022):8. |
| 条目包含的文件 | 条目无相关文件。 | |||||
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