Photoirradiation-Induced Capacitance Enhancement in the h-WO3/Bi2WO6 Submicron Rod Heterostructure under Simulated Solar Illumination and Its Postillumination Capacitance Enhancement Retainment from a Photocatalytic Memory Effect | |
Ma, Huiqin1,2; Yang, Weiyi3; Gao, Shuang3; Lin, Zifeng4; Mo, Zheyang1,2; Li, Chao5; Shang, Jian Ku2; Li, Qi3 | |
通讯作者 | Li, Qi(qiliuiuc@outlook.com) |
2021-12-08 | |
发表期刊 | ACS APPLIED MATERIALS & INTERFACES
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ISSN | 1944-8244 |
卷号 | 13期号:48页码:57214-57229 |
摘要 | Recently, photoassisted charging has been demonstrated as a green and sustainable approach to successfully enhance the capacitance of supercapacitors with low cost and good efficiency. However, their light-induced capacitance enhancement is relatively low and is lost quickly when the illumination is off. In this work, a novel active material system is developed for supercapacitors with the photoassisted charging capability by the decoration of a small amount of Bi2WO6 nanoparticles on an h-WO3 submicron rod surface in situ, which forms a typical type II band alignment heterostructure with a close contact interface through the co-sharing of W atoms between h-WO3 submicron rods and Bi2WO6 nanoparticles. The photogenerated charge carrier separation and transfer are largely enhanced in the h-WO3 /Bi2WO6 submicron rod electrode, which subsequently allows more charge carriers to participate in its photoassisted charging process to largely enhance its capacitance improvement under simulated solar illumination than that of the h-WO3 submicron rod electrode. Furthermore, the h-WO3/Bi2WO6 submicron rod electrode could retain its photoinduced capacitance enhancement in the dark for an extended period of time from the photocatalytic memory effect. Thus, our work provides a solution to the two major drawbacks of reported supercapacitors with the light-induced capacitance enhancement property, and supercapacitors based on active materials with the photocatalytic memory effect could be utilized in various technical fields. |
关键词 | supercapacitors h-WO3 /Bi2WO6 heterojunctions photoinduced capacitance enhancements photocatalytic memory effect postillumination capacitance enhancement retainment |
资助者 | National Natural Science Foundation of China ; Fundamental Research Funds for the Central Universities ; Sichuan Science and Technology Program |
DOI | 10.1021/acsami.1c17386 |
收录类别 | SCI |
语种 | 英语 |
资助项目 | National Natural Science Foundation of China[51672283] ; National Natural Science Foundation of China[51602316] ; National Natural Science Foundation of China[51902271] ; Fundamental Research Funds for the Central Universities[2682021CX116] ; Fundamental Research Funds for the Central Universities[2682020CX07] ; Fundamental Research Funds for the Central Universities[2682020CX08] ; Sichuan Science and Technology Program[2020YJ0259] ; Sichuan Science and Technology Program[2020YJ0072] ; Sichuan Science and Technology Program[2021YFH0163] |
WOS研究方向 | Science & Technology - Other Topics ; Materials Science |
WOS类目 | Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary |
WOS记录号 | WOS:000752970600042 |
出版者 | AMER CHEMICAL SOC |
引用统计 | |
文献类型 | 期刊论文 |
条目标识符 | http://ir.imr.ac.cn/handle/321006/173472 |
专题 | 中国科学院金属研究所 |
通讯作者 | Li, Qi |
作者单位 | 1.Chinese Acad Sci, Inst Met Res, Shenyang Natl Lab Mat Sci, Shenyang 110016, Peoples R China 2.Univ Sci & Technol China, Sch Mat Sci & Engn, Shenyang 110016, Peoples R China 3.Southwest Jiaotong Univ, Sch Mat Sci & Engn, Key Lab Adv Technol Mat, Minist Educ, Chengdu 610031, Peoples R China 4.Sichuan Univ, Coll Mat Sci & Engn, Chengdu 610041, Peoples R China 5.Shandong Univ Technol, Sch Mat Sci & Engn, Zibo 255000, Peoples R China |
推荐引用方式 GB/T 7714 | Ma, Huiqin,Yang, Weiyi,Gao, Shuang,et al. Photoirradiation-Induced Capacitance Enhancement in the h-WO3/Bi2WO6 Submicron Rod Heterostructure under Simulated Solar Illumination and Its Postillumination Capacitance Enhancement Retainment from a Photocatalytic Memory Effect[J]. ACS APPLIED MATERIALS & INTERFACES,2021,13(48):57214-57229. |
APA | Ma, Huiqin.,Yang, Weiyi.,Gao, Shuang.,Lin, Zifeng.,Mo, Zheyang.,...&Li, Qi.(2021).Photoirradiation-Induced Capacitance Enhancement in the h-WO3/Bi2WO6 Submicron Rod Heterostructure under Simulated Solar Illumination and Its Postillumination Capacitance Enhancement Retainment from a Photocatalytic Memory Effect.ACS APPLIED MATERIALS & INTERFACES,13(48),57214-57229. |
MLA | Ma, Huiqin,et al."Photoirradiation-Induced Capacitance Enhancement in the h-WO3/Bi2WO6 Submicron Rod Heterostructure under Simulated Solar Illumination and Its Postillumination Capacitance Enhancement Retainment from a Photocatalytic Memory Effect".ACS APPLIED MATERIALS & INTERFACES 13.48(2021):57214-57229. |
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