IMR OpenIR
High pressure suppressing grain boundary migration in a nanograined nickel
Guo, X. K.1,2; Dong, H. L.3; Luo, Z. P.1; Chen, Bin3; Li, X. Y.1
通讯作者Luo, Z. P.(zpluo@imr.ac.cn)
2022-06-01
发表期刊SCRIPTA MATERIALIA
ISSN1359-6462
卷号214页码:6
摘要Grain boundaries (GBs) of nanograined metals are prone to migrate when subjected to mechanical loading. In this study, nanograined pure nickel samples with an average grain size of about 70 nm were deformed under pressure of 20 GPa and 43 GPa using a diamond anvil cell. It was found that the average grain size decreased slightly after high pressure compression, which meant high pressure suppressed the nanograin boundaries migration. Extensive extended dislocations with large dissociation width (averagely 5-6 nm) as well as LomerCottrell locks were observed in the high pressure deformed nanograined Ni, indicating that partial dislocation activities dominated the plastic deformation, which may facilitate to relax GBs and thus suppress GBs migration. The finding of this study may help to fabricate stable nanocrystalline metals.
关键词Nanograined metals Grain boundary migration High pressure Deformation mechanism Partial dislocation
资助者Ministry of Sci-ence & Technology of China ; National Science Foundation of China ; Liaoning Revitalization Talents Program
DOI10.1016/j.scriptamat.2022.114656
收录类别SCI
语种英语
资助项目Ministry of Sci-ence & Technology of China[2017YFA0700700] ; Ministry of Sci-ence & Technology of China[2017YFA0204401] ; National Science Foundation of China[51701216] ; Liaoning Revitalization Talents Program[XLYC1808008]
WOS研究方向Science & Technology - Other Topics ; Materials Science ; Metallurgy & Metallurgical Engineering
WOS类目Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Metallurgy & Metallurgical Engineering
WOS记录号WOS:000791254600002
出版者PERGAMON-ELSEVIER SCIENCE LTD
引用统计
被引频次:11[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.imr.ac.cn/handle/321006/173936
专题中国科学院金属研究所
通讯作者Luo, Z. P.
作者单位1.Chinese Acad Sci, Inst Met Res, Shenyang Natl Lab Mat Sci, 72 Wenhua Rd, Shenyang 110016, Peoples R China
2.Univ Sci & Technol China, Sch Mat Sci & Engn, Hefei 230026, Peoples R China
3.Ctr High Pressure Sci & Technol Adv Res, Shanghai 201203, Peoples R China
推荐引用方式
GB/T 7714
Guo, X. K.,Dong, H. L.,Luo, Z. P.,et al. High pressure suppressing grain boundary migration in a nanograined nickel[J]. SCRIPTA MATERIALIA,2022,214:6.
APA Guo, X. K.,Dong, H. L.,Luo, Z. P.,Chen, Bin,&Li, X. Y..(2022).High pressure suppressing grain boundary migration in a nanograined nickel.SCRIPTA MATERIALIA,214,6.
MLA Guo, X. K.,et al."High pressure suppressing grain boundary migration in a nanograined nickel".SCRIPTA MATERIALIA 214(2022):6.
条目包含的文件
条目无相关文件。
个性服务
推荐该条目
保存到收藏夹
查看访问统计
导出为Endnote文件
谷歌学术
谷歌学术中相似的文章
[Guo, X. K.]的文章
[Dong, H. L.]的文章
[Luo, Z. P.]的文章
百度学术
百度学术中相似的文章
[Guo, X. K.]的文章
[Dong, H. L.]的文章
[Luo, Z. P.]的文章
必应学术
必应学术中相似的文章
[Guo, X. K.]的文章
[Dong, H. L.]的文章
[Luo, Z. P.]的文章
相关权益政策
暂无数据
收藏/分享
所有评论 (0)
暂无评论
 

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。