Polycrystalline nickel were implanted with 150 Kev phosphorus ions to a dose of 5 * 10~(16) ions/cm~2 at room temperature and with 50 Kev boron ions to a dose of 3 * 10~(17) ions/cm~2 at 170 ℃, respectively. The specimens with and without phosphorus and boron implantation were tested in microhardness and load unload tensile fatigue under stress-controlled condition. The surface layer structure was investigated with AES, IMA, SEM, and TEM before and after implantation and/or fatigue. Possible strengthening mechanisms for these experimental results will be discussed.
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