Atomic-scale investigation of Si/Al interface in multilayer aluminum sheets using HRTEM and first-principle calculation

doi:10.1016/j.vacuum.2023.112390

IMR OpenIR

	Atomic-scale investigation of Si/Al interface in multilayer aluminum sheets using HRTEM and first-principle calculation
	Yuan, Zhipeng 1; Chang, Jiashuo 1; Tu, Yiyou 2; Liu, Chen 3,4; Yuan, Ting 5; Huang, Liang 1; Ni, Zenglei 1; Wang, Xingxing 1; Peng, Jin 1; Ling, Zicheng 1
通讯作者	Tu, Yiyou(tuyiyou@seu.edu.cn) ; Yuan, Ting(rabbityt@163.com)
	2023-10-01
发表期刊	VACUUM
ISSN	0042-207X
卷号	216 页码:8
摘要	The atomic-scale structure and electronic structure of the interface between Si precipitates and the Al matrix in multi-layered aluminum sheets are investigated by combining high-resolution transmission electron microscopy (HRTEM) with first-principles calculation. The results show that Si needle precipitates and Guinier Preston (GP) zones occur during the natural aging process of the core material in automotive heat exchangers. In addition, Al (Fe,Mn)Si precipitate can serve as effective heterogeneous nucleation sites for the formation of high-density Si precipitates during aging. The charge density differences analysis shows that the formation of covalent bonds between interfacial Si and Al atoms is crucial to the interfacial bonding strength. These results provide important insights for future research efforts focused on the production of multilayer aluminum sheets with highperformance.
关键词	Microstructure Si Al interface Interface bonding strength First-principle calculation
DOI	10.1016/j.vacuum.2023.112390
收录类别	SCI
语种	英语
WOS研究方向	Materials Science ; Physics
WOS类目	Materials Science, Multidisciplinary ; Physics, Applied
WOS记录号	WOS:001049449500001
出版者	PERGAMON-ELSEVIER SCIENCE LTD
引用统计	被引频次：2[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/178895
专题	中国科学院金属研究所
通讯作者	Tu, Yiyou; Yuan, Ting
作者单位	1.North China Univ Water Resources & Elect Power, Sch Mat Sci & Engn, Zhengzhou 450040, Peoples R China 2.Southeast Univ, Sch Mat Sci & Engn, Nanjing 211189, Peoples R China 3.Chinese Acad Sci, Inst Met Res, Shenyang Natl Lab Mat Sci, Shenyang 110016, Peoples R China 4.Univ Sci & Technol China, Sch Mat Sci & Engn, Hefei 230026, Anhui, Peoples R China 5.Changshu Inst Technol, Sch Mat Engn, Changshu 215500, Peoples R China
推荐引用方式 GB/T 7714	Yuan, Zhipeng,Chang, Jiashuo,Tu, Yiyou,et al. Atomic-scale investigation of Si/Al interface in multilayer aluminum sheets using HRTEM and first-principle calculation[J]. VACUUM,2023,216:8.
APA	Yuan, Zhipeng.,Chang, Jiashuo.,Tu, Yiyou.,Liu, Chen.,Yuan, Ting.,...&Ling, Zicheng.(2023).Atomic-scale investigation of Si/Al interface in multilayer aluminum sheets using HRTEM and first-principle calculation.VACUUM,216,8.
MLA	Yuan, Zhipeng,et al."Atomic-scale investigation of Si/Al interface in multilayer aluminum sheets using HRTEM and first-principle calculation".VACUUM 216(2023):8.