Retarding the effect of Ta on high-temperature oxidation of sputtered nanocrystalline coatings

doi:10.1016/j.jmst.2023.11.005

IMR OpenIR

	Retarding the effect of Ta on high-temperature oxidation of sputtered nanocrystalline coatings
	Meng, Bo 1; Yang, Lanlan 2; Wang, Qunchang 1; Wang, Jinlong 1; Chen, Minghui 1; Zhu, Shenglong 1,3; Wang, Fuhui 1,3
通讯作者	Wang, Jinlong(wangjinlong@mail.neu.edu.cn)
	2024-06-10
发表期刊	JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY
ISSN	1005-0302
卷号	184 页码:195-206
摘要	The presence of excess Ta in high-temperature protective coatings can compromise the integrity of the Al2 O3 scale on the surface, which has a negative impact on the oxidation behavior and reduces the service life. The effects of oxygen doping on the isothermal oxidation of three sputtered nanocrystalline coatings were investigated at 1100 degrees C. The results indicated that oxygen doping inhibited the diffusion of Ta from the coating to the oxide scale, which was primarily attributed to the preferential oxidation of the Al in the coating. However, excess oxygen doping decreased the amount of Al available for the formation of the Al2 O3 scale on the coating, thus reducing the inhibitory effect on Ta oxidation. Moreover, doping with excess O caused spalling of the oxide scale. Therefore, the right balance in O doping is crucial for suppressing Ta oxidation while maintaining the integrity of the oxide scale. (c) 2023 Published by Elsevier Ltd on behalf of The editorial office of Journal of Materials Science & Technology.
关键词	High-temperature oxidation Oxygen doping Nanocrystalline coating Ta-rich phase Residual stress
资助者	National Natural Science Foundation of China ; Fundamental Research Funds for the Central Universities ; Ministry of Industry and Information Technology Project
DOI	10.1016/j.jmst.2023.11.005
收录类别	SCI
语种	英语
资助项目	National Natural Science Foundation of China[51671053] ; National Natural Science Foundation of China[51801021] ; Fundamental Research Funds for the Central Universities[N2302007] ; Ministry of Industry and Information Technology Project[MJ-2017-J-99]
WOS研究方向	Materials Science ; Metallurgy & Metallurgical Engineering
WOS类目	Materials Science, Multidisciplinary ; Metallurgy & Metallurgical Engineering
WOS记录号	WOS:001140268100001
出版者	JOURNAL MATER SCI TECHNOL
引用统计
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/183479
专题	中国科学院金属研究所
通讯作者	Wang, Jinlong
作者单位	1.Northeastern Univ, Shenyang Natl Lab Mat Sci, Shenyang 110819, Peoples R China 2.Jiangsu Univ Sci & Technol, Sch Mat Sci & Engn, Zhenjiang 212003, Peoples R China 3.Chinese Acad Sci, Inst Met Res, Shenyang 110016, Peoples R China
推荐引用方式 GB/T 7714	Meng, Bo,Yang, Lanlan,Wang, Qunchang,et al. Retarding the effect of Ta on high-temperature oxidation of sputtered nanocrystalline coatings[J]. JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY,2024,184:195-206.
APA	Meng, Bo.,Yang, Lanlan.,Wang, Qunchang.,Wang, Jinlong.,Chen, Minghui.,...&Wang, Fuhui.(2024).Retarding the effect of Ta on high-temperature oxidation of sputtered nanocrystalline coatings.JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY,184,195-206.
MLA	Meng, Bo,et al."Retarding the effect of Ta on high-temperature oxidation of sputtered nanocrystalline coatings".JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY 184(2024):195-206.