A Ta 3 N 5 photoanode with few deep- level defects derived from topologic transition of ammonium tantalum oxyfluoride for ultralow- bias photoelectrochemical water splitting

doi:10.1016/S1872-2067(24)60056-2

IMR OpenIR

	A Ta 3 N 5 photoanode with few deep- level defects derived from topologic transition of ammonium tantalum oxyfluoride for ultralow- bias photoelectrochemical water splitting
	Xu, Wei 1,2; Zhen, Chao 1,2; Zhu, Huaze 1,2; Yao, Tingting 1,2; Qiu, Jianhang 1,2; Liang, Yan 1,2; Bai, Shuo 1,3; Chen, Chunlin 2; Cheng, Hui -Ming 1,4; Liu, Gang 1,2
通讯作者	Zhen, Chao(czhen@imr.ac.cn) ; Liu, Gang(gangliu@imr.ac.cn)
	2024-06-01
发表期刊	CHINESE JOURNAL OF CATALYSIS
ISSN	0253-9837
卷号	61 页码:144-153
摘要	An open challenge for developing solar-driven Ta 3 N 5-based photoanodes with the ability to induce low-bias photoelectrochemical (PEC) water splitting is that their deep-level defects originated from low-valent tantalum cations (Ta 3+ ) and nitrogen vacancies (V N ) seriously reduce the photovoltage and thus increase the bias for water splitting. Herein, we developed an effective topotactic transition synthesis route of producing few deep-level defects porous Ta 3 N 5 film from the precursor film of ammonium tantalum oxyfluoride compound ((NH 4 ) 2 Ta 2 O 3 F 6 ) pyramids on the Ta foil. The highly electronegative fluoride ions in (NH 4 ) 2 Ta 2 O 3 F 6 could weaken the Ta-O bonds and the accompanied porous structure facilitates reactant diffusion, which favors the complete nitridation. Consequently, the resulting porous Ta 3 N 5 film has very few deep-level defects, enabling an ultralow photocurrent onset potential at 0.2 V ( vs . RHE) and a short-circuit photocurrent density ( J sc ) of 3.28 mA cm -2 after decorating oxygen evolution reaction (OER) cocatalysts under AM 1.5 G irradiation. Moreover, the J sc can retain 85% of the initial value for a 5 h continuous stability test. By reducing the particle size of (NH 4 ) 2 Ta 2 O 3 F 6 pyramid precursor, the deep-level defects could be further lowered in the Ta 3 N 5 film, achieving the photoactivity for water oxidation at 0 V ( vs . RHE) after modifying the OER co-catalyst. (c) 2024, Dalian Institute of Chemical Physics, Chinese Academy of Sciences. Published by Elsevier B.V. All rights reserved.
关键词	Topologic transition Onset potential Photoelectrochemical water splitting
资助者	National Natural Science Foundation of China ; National Key R&D Program of China ; Youth Innovation Promotion Association of the Chinese Academy of Sciences ; CAS Projects for Young Scientists in Basic Research ; New Cornerstone Science Foundation through the XPLORER PRIZE
DOI	10.1016/S1872-2067(24)60056-2
收录类别	SCI
语种	英语
资助项目	National Natural Science Foundation of China[52425201] ; National Natural Science Foundation of China[52072377] ; National Natural Science Foundation of China[52188101] ; National Key R&D Program of China[2021YFA1500800] ; Youth Innovation Promotion Association of the Chinese Academy of Sciences[2020192] ; CAS Projects for Young Scientists in Basic Research[YSBR-004] ; New Cornerstone Science Foundation through the XPLORER PRIZE
WOS研究方向	Chemistry ; Engineering
WOS类目	Chemistry, Applied ; Chemistry, Physical ; Engineering, Chemical
WOS记录号	WOS:001268542300001
出版者	ELSEVIER
引用统计	被引频次：2[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/188298
专题	中国科学院金属研究所
通讯作者	Zhen, Chao; Liu, Gang
作者单位	1.Chinese Acad Sci, Inst Met Res, Shenyang Natl Lab Mat Sci, Shenyang 110016, Liaoning, Peoples R China 2.Univ Sci & Technol China, Sch Mat Sci & Engn, Shenyang 110016, Liaoning, Peoples R China 3.Chinese Acad Sci, Inst Met Res, Shi Changxu Innovat Ctr Adv Mat, Shenyang 110016, Liaoning, Peoples R China 4.Chinese Acad Sci, Inst Technol Carbon Neutral, Shenzhen Inst Adv Technol, Shenzhen 518055, Guangdong, Peoples R China
推荐引用方式 GB/T 7714	Xu, Wei,Zhen, Chao,Zhu, Huaze,et al. A Ta 3 N 5 photoanode with few deep- level defects derived from topologic transition of ammonium tantalum oxyfluoride for ultralow- bias photoelectrochemical water splitting[J]. CHINESE JOURNAL OF CATALYSIS,2024,61:144-153.
APA	Xu, Wei.,Zhen, Chao.,Zhu, Huaze.,Yao, Tingting.,Qiu, Jianhang.,...&Liu, Gang.(2024).A Ta 3 N 5 photoanode with few deep- level defects derived from topologic transition of ammonium tantalum oxyfluoride for ultralow- bias photoelectrochemical water splitting.CHINESE JOURNAL OF CATALYSIS,61,144-153.
MLA	Xu, Wei,et al."A Ta 3 N 5 photoanode with few deep- level defects derived from topologic transition of ammonium tantalum oxyfluoride for ultralow- bias photoelectrochemical water splitting".CHINESE JOURNAL OF CATALYSIS 61(2024):144-153.