Atomic-level rhodium doping into NiO for boosting the selective electrooxidation of HMF to FFCA in neutral electrolyte

doi:10.1016/j.cej.2024.154092

IMR OpenIR

	Atomic-level rhodium doping into NiO for boosting the selective electrooxidation of HMF to FFCA in neutral electrolyte
	Lu, Xingyu 1,2; Wang, Di 1,2; Dai, Xueya 1,2; Li, Yunlong 1,2; Qin, Xiaolan 1,2; Qi, Wei 1,2
通讯作者	Qi, Wei(wqi@imr.ac.cn)
	2024-09-15
发表期刊	CHEMICAL ENGINEERING JOURNAL
ISSN	1385-8947
卷号	496 页码:9
摘要	The oxidation reaction of the biomass derivative 5-hydroxymethylfurfural (HMF) holds immense promise for the sustainable synthesis of high-value chemicals. Nevertheless, achieving the selective electrooxidation of HMF to generate high value-added formyl-2-furan carboxylic acid (FFCA) intermediate remains a serious challenge. Here, the V-NiO-Rh catalyst was constructed and demonstrates an impressive FFCA selectivity of 71 % for HMF electrooxidation reaction (HMFOR) in neutral electrolyte. The designed experiments elucidate that the HMFOR mechanism is the co-adsorption of OH* and HMF* on Ni active sites. Furthermore, the theoretical calculations prove that the modulation of Ni electronic structure by single atom Rh promotes the ability of HMF adsorption and the water electrolysis to release OH*. This paper establishes a theoretical foundation for the selective synthesis of high value-added intermediates products that are challenging to obtain in alkaline media.
关键词	Electrooxidation 5-hydroxymethylfurfural Formyl-2-furan carboxylic acid Single atom Electronic structural engineering
资助者	National Natural Science Foundation of China ; Shccig-Qinling Program ; China Baowu Low Carbon Metallurgy Innovation Foundation ; IMR Innovation Fund
DOI	10.1016/j.cej.2024.154092
收录类别	SCI
语种	英语
资助项目	National Natural Science Foundation of China[22072163] ; National Natural Science Foundation of China[U23A20545] ; Shccig-Qinling Program ; China Baowu Low Carbon Metallurgy Innovation Foundation[BWLCF202113] ; IMR Innovation Fund[2023-PY13]
WOS研究方向	Engineering
WOS类目	Engineering, Environmental ; Engineering, Chemical
WOS记录号	WOS:001283663700001
出版者	ELSEVIER SCIENCE SA
引用统计	被引频次：5[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/188732
专题	中国科学院金属研究所
通讯作者	Qi, Wei
作者单位	1.Chinese Acad Sci, Inst Met Res, Shenyang Natl Lab Mat Sci, Shenyang 110016, Liaoning, Peoples R China 2.Univ Sci & Technol China, Sch Mat Sci & Engn, Shenyang 110016, Liaoning, Peoples R China
推荐引用方式 GB/T 7714	Lu, Xingyu,Wang, Di,Dai, Xueya,et al. Atomic-level rhodium doping into NiO for boosting the selective electrooxidation of HMF to FFCA in neutral electrolyte[J]. CHEMICAL ENGINEERING JOURNAL,2024,496:9.
APA	Lu, Xingyu,Wang, Di,Dai, Xueya,Li, Yunlong,Qin, Xiaolan,&Qi, Wei.(2024).Atomic-level rhodium doping into NiO for boosting the selective electrooxidation of HMF to FFCA in neutral electrolyte.CHEMICAL ENGINEERING JOURNAL,496,9.
MLA	Lu, Xingyu,et al."Atomic-level rhodium doping into NiO for boosting the selective electrooxidation of HMF to FFCA in neutral electrolyte".CHEMICAL ENGINEERING JOURNAL 496(2024):9.